Template Washing Using Vacuum Ultraviolet Light
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current template washing methods for nanoimprint technologies face challenges in efficiently removing resist residuals, leading to secondary contamination and reduced production efficiency due to the adhesion of dispersed resist residuals and the inability to reliably remove resist residuals using photowashing methods.
Innovation Solution
A template washing method utilizing vacuum-ultraviolet light irradiation under dry air with a controlled dew point and temperature, specifically between −110° C. and 10° C. and 25° C. to 150° C., respectively, to prevent the formation of sulfur and phosphorus compounds, ensuring effective removal of resist residuals from the template surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the pattern surface of the template is immersed in cleaning agent and irradiated with ultraviolet light to generate radicals, then resist residual is degraded and removed, but resist residual disperses in the cleaning agent and causes secondary contamination
Solution Approach 1:
The patent uses an inert atmosphere (nitrogen or rare gas) instead of oxygen-containing atmosphere during vacuum ultraviolet irradiation. This prevents the oxidation of decomposed resist residual that would otherwise form sulfur and phosphorus compounds, thereby eliminating secondary contamination while maintaining effective resist residual removal.
Solution Approach 2:
The patent changes the atmospheric composition parameter from oxygen-containing air to inert gas (nitrogen or rare gas). This parameter change fundamentally alters the chemical reaction pathways, preventing the formation of harmful sulfur and phosphorus compounds while maintaining the effectiveness of resist residual decomposition through vacuum ultraviolet irradiation.
2Object-generated harmful factors
If photowashing method is used to wash the template, then foreign substances are degraded and removed, but resist residual can hardly be removed reliably
Solution Approach 1:
The patent replaces the conventional photowashing method (using visible or near-ultraviolet light) with vacuum ultraviolet irradiation. This substitution changes the energy characteristics of the irradiation, enabling direct decomposition and removal of sulfur and phosphorus compounds from resist residual that cannot be effectively removed by conventional photowashing methods.
Solution Approach 2:
The patent changes the wavelength parameter of the irradiation light to the vacuum ultraviolet range, which has sufficient energy to decompose and remove sulfur and phosphorus compounds from resist residual. This parameter change enables reliable resist residual removal that conventional photowashing cannot achieve.
3Manufacturing precision
If the template is removed from the nanoimprint apparatus and then mounted after washing, then the template can be washed, but production efficiency is lowered due to long stop time
Solution Approach 1:
The patent merges the template washing function with the nanoimprint apparatus itself, integrating the vacuum ultraviolet irradiation system directly into the apparatus. This allows the template to be washed in-situ without removal, combining the washing process with the pattern formation process and eliminating the time loss associated with template removal and remounting.
Solution Approach 2:
The patent enables continuous operation by performing template washing in-situ within the nanoimprint apparatus without interrupting the production flow. The template remains in the apparatus throughout the washing process, maintaining continuous useful action and eliminating downtime that would otherwise reduce production efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively removes resist residuals, reducing defects in pattern formation and maintaining production efficiency by preventing the generation of sulfur and phosphorus compounds, thereby ensuring a cleaner template surface for subsequent nanoimprint processes.
Implementation Method 1
irradiating the pattern surface of the template with vacuum ultraviolet light to generate radicals such as oxygen radical or OH radical by photoexciting the cleaning agent
Implementation Method 2
a surface of the glass substrate is irradiated with vacuum ultraviolet light and hence foreign substances are degraded by energy of the vacuum ultraviolet light
Implementation Method 3
the degraded substances are oxidized and gasified by active oxygen such as radical oxygen, or ozone generated by irradiation of oxygen in the air with the vacuum ultraviolet light
Data Source
AI summary
A template washing method and a photowashing apparatus which ensure removal of resist residual remaining on a pattern surface of a template, a pattern forming method and a nanoimprint apparatus which ensure formation of patterns with fewer defects are provided. The template washing method of the invention for photowashing the pattern surface of the template used in nanoimprint includes a vacuum-ultraviolet light irradiation process for irradiating the pattern surface of the template with vacuum ultraviolet light under an atmosphere of dry air.