TFT Array Substrate Manufacturing with Integrated Color Filters
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Solution Overview
Problem
The conventional manufacturing process for TFT array substrates is complex and costly, requiring at least eight mask processes and involving difficulty in forming contact windows in thick film layers, which affects production yield.
Innovation Solution
A method that simplifies the process by forming patterned conductive, insulating, and channel layers to create gate lines, then integrating color filter patterns and transparent electrode layers to reduce the number of mask processes, eliminating the need for contact windows in thick film layers, and using a black matrix for masking and exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional manufacturing process with multiple mask processes is used, then color filter patterns can be formed on TFT array substrate, but manufacturing complexity and cost increase significantly
Solution Approach 1:
The patent merges the color filter formation process with the TFT array substrate manufacturing process by integrating color filter patterns directly onto the TFT array substrate during the same manufacturing sequence. This eliminates the need for separate color filter substrate assembly and multiple alignment operations, reducing manufacturing complexity while maintaining precision.
Solution Approach 2:
The manufacturing process is designed to perform multiple functions simultaneously: forming TFT structures, creating color filter patterns, and establishing electrical connections all in one integrated process flow. This multi-functional approach reduces the total number of manufacturing steps and mask processes required.
2Manufacturing precision
If conventional manufacturing process with thick film layers is used, then color filter patterns can be formed, but forming contact windows becomes difficult and production yield decreases
Solution Approach 1:
The patent performs preliminary actions by forming the color filter patterns and planarization layer with integrated contact window openings from the beginning of the manufacturing process. Rather than attempting to create high aspect ratio contact windows through thick layers later, the contact windows are formed concurrently with the color filter patterns, eliminating the difficulty of penetrating thick film layers and improving production yield.
3Ease of manufacture
If color filter substrate is assembled separately to TFT array substrate, then color filter patterns can be applied, but alignment errors occur and assembly complexity increases
Solution Approach 1:
The patent combines the TFT array substrate and color filter substrate into a single integrated structure manufactured in one process sequence. The color filter patterns are formed directly on the TFT array substrate using the same manufacturing equipment and process steps, eliminating separate assembly operations and ensuring perfect alignment without alignment errors.
Data Source
AI summary
A method for manufacturing a thin film transistor (TFT) array substrate needs only or even less than six mask processes for manufacturing the TFT array substrate integrated with a color filter pattern. Therefore, the manufacturing method is simpler and the manufacturing cost is reduced. In addition, the manufacturing method needs not to form a contact window in a relative thick film layer such as a planarization layer or a color filter layer, so as to connect the pixel electrode to the source/drain. Thus, the difficulty of the manufacturing process is effectively reduced.