Water-Soluble Organic Layer for TFT Peeling Efficiency
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Solution Overview
Problem
The peeling process of a transparent electrode in TFT-LCD manufacturing is inefficient due to a small peeling area where the stripping solution contacts, leading to low peeling efficiency and residual photoresist, which affects panel quality.
Innovation Solution
A method involving the deposition of a water-soluble organic layer on a passivation layer, followed by a photoresist layer, dry etching, and peeling using a stripping solution to increase the peeling area and enhance efficiency, where the water-soluble organic layer is dissolved to facilitate the removal of the photoresist and transparent electrode.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a conventional photolithography process with direct transparent electrode formation is used, then the manufacturing process is simplified, but the peeling efficiency of photoresist from transparent electrode becomes low due to small peeling area
Solution Approach 1:
The patent introduces a water-soluble organic layer as an intermediary between the photoresist layer and the transparent electrode. This intermediate layer enables the stripping solution to access and dissolve photoresist from areas that would otherwise be inaccessible, thereby improving peeling efficiency without complicating the overall manufacturing process.
Solution Approach 2:
The patent creates an undercut structure by controlling the thickness profile of the water-soluble organic layer, making it thinner at edges than at the center. This dimensional variation provides additional access pathways for the stripping solution from lateral directions, expanding the effective peeling area beyond what is available with flat-layer configurations.
2Reliability
If the photoresist is covered by the transparent electrode, then the electrode structure is complete, but the peeling area for stripping solution contact becomes small
Solution Approach 1:
The patent segments the layer structure by introducing a water-soluble organic layer with varying thickness between the photoresist and transparent electrode. This segmentation creates distinct functional zones: a thick central region for electrode support and thin edge regions for peeling access, thereby maintaining structural integrity while expanding peeling area.
Solution Approach 2:
The patent creates a nested structure where the water-soluble organic layer is positioned between the photoresist layer and transparent electrode, with the stripping solution able to access this intermediate layer from lateral directions. This nested configuration allows the stripping solution to reach photoresist areas that are otherwise covered by the transparent electrode.
3Area of stationary object
If undercut area is small, then the electrode coverage is maximized, but the peeling efficiency becomes low and photoresist remains
Solution Approach 1:
The patent applies local quality variation by making the water-soluble organic layer non-uniform in thickness: thicker at the center to maintain electrode coverage and thinner at the edges to provide peeling access. This local differentiation allows the same layer structure to serve dual functions of maintaining coverage and enabling efficient peeling.
Solution Approach 2:
The patent utilizes vertical dimension control of the water-soluble organic layer thickness to create lateral access pathways. By reducing the thickness at edges, the patent creates undercut areas that allow stripping solution to access photoresist from the sides, effectively expanding peeling area without reducing electrode coverage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method increases the peeling efficiency of the transparent electrode by expanding the peeling area, allowing for smoother removal and improving panel quality by dissolving the water-soluble organic layer with a stripping solution.
Implementation Method 1
a step S70 of peeling off the water-soluble organic layer pattern and the photoresist layer pattern, and removing the second electrode to pattern the transparent electrode
Data Source
AI summary
A method of manufacturing an array substrate and a display device includes forming a water-soluble organic layer on a surface of a passivation layer, forming a photoresist layer on a surface of the water-soluble organic layer to perform a yellow light process to form a photoresist layer pattern, a cross-section of a water-soluble organic area is less than a cross-section of a bottom surface of a photoresist area, and dry etching the passivation layer such that a cross-section of the passivation layer pattern is the same as a cross-section of the water-soluble organic layer pattern.