Thermocouple Support for Semiconductor Substrate Processing
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Solution Overview
Problem
In semiconductor manufacturing, the use of a profile thermocouple in heat treatment processes requires a significant wait time for temperature stabilization, which affects processing capacity and results in additional maintenance needs due to heat exposure.
Innovation Solution
A substrate processing apparatus with a reaction tube, heating unit, protection tube, insulating tube with through-holes, and thermocouple wires inserted through these holes, allowing for direct temperature detection and feedback control without the need for a profile thermocouple, thereby reducing wait times and maintenance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a profile thermocouple is disposed inside the reaction tube to measure temperature, then temperature measurement accuracy is improved, but the wait time for temperature stabilization increases significantly
Solution Approach 1:
A protection tube made of heat-resistant material (quartz or ceramic) is introduced as an intermediary component. The profile thermocouple is disposed inside this protection tube, which is positioned inside the reaction tube. This intermediary structure allows the thermocouple to measure the temperature inside the reaction tube without being directly exposed to the harsh heat treatment environment, enabling accurate temperature measurement while reducing the wait time for stabilization.
2Loss of time
If the profile thermocouple is continuously disposed inside the reaction tube for direct feedback control, then the wait time is reduced, but maintenance needs increase due to heat exposure
Solution Approach 1:
The protection tube serves as a protective intermediary that shields the profile thermocouple from direct heat exposure. This allows the thermocouple to remain continuously disposed inside the reaction tube for real-time temperature monitoring and feedback control without suffering from the harmful effects of high temperature, thereby reducing maintenance needs while maintaining short wait times.
3Productivity
If the protection tube is heat-treated continuously, then temperature measurement capability is maintained, but waste is generated and periodic maintenance is required
Solution Approach 1:
The profile thermocouple is extracted from the harsh heat treatment environment and placed inside the protection tube. This separation allows the thermocouple to function as a temperature sensor without being subjected to the heat treatment process itself, eliminating the waste generation and periodic maintenance issues associated with continuously heat-treating the protection tube while maintaining temperature measurement capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration shortens the wait time for heat treatment initiation and improves temperature measurement accuracy, reducing maintenance needs and enhancing processing efficiency.
Implementation Method 1
a thermocouple (hereinafter referred to as heater thermocouple) is disposed between the reaction tube and a heater to measure a temperature inside the heater
Implementation Method 2
a heater provided to surround an outside of the reaction tube
Data Source
AI summary
A substrate processing apparatus includes: a reaction tube configured to accommodate a substrate holder holding a plurality of substrates and process a substrate held on the substrate holder; a heating unit installed outside the reaction tube and configured to heat an inside of the reaction tube; a protection tube installed to extend in a vertical direction in contact with an outer wall of the reaction tube; an insulating tube disposed inside the protection tube and having through-holes extending in a vertical direction; a thermocouple having a thermocouple junction provided at an upper end thereof, and thermocouple wires joined at the thermocouple junction and inserted into the through-holes of the insulating tube; a gas supply unit configured to supply a gas, for processing a substrate accommodated in the reaction tube, into the reaction tube; and an exhaust unit configured to exhaust a gas from the reaction tube.