Thermoreactive Polymer Substrate Cleaning via Phase Transition
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Solution Overview
Problem
Conventional substrate cleaning methods require high temperatures, complex processes, and expensive materials, and can damage underlying patterns, while existing techniques struggle to effectively remove particles from substrates with patterns without leaving residues.
Innovation Solution
A method and apparatus using a thermoreactive polymer resin in a solvent, which gels at a phase transition temperature to trap particles and liquefies at a lower temperature for easy removal, simplifying the cleaning process and minimizing pattern damage, with a rinse solution and potential recycling of the cleaning solution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a film forming solution is heated at high temperature to volatilize volatile components and solidify the film, then particles are trapped effectively, but the process requires high temperature of 100°C or more and complex multiple solution supply steps
Solution Approach 1:
The patent applies phase transition of a thermoreactive polymer from liquid to gel state at a specific transition temperature to trap particles. The polymer solution is heated to the transition temperature to form a gel that captures particles, then cooled to liquefy the gel for easy removal. This single phase transition mechanism replaces the complex multi-step process involving multiple solutions and high-temperature volatilization.
Solution Approach 2:
The patent changes the temperature parameter to control the phase state of the thermoreactive polymer. By heating to the transition temperature, the polymer transforms from liquid to gel state for particle trapping. Subsequent cooling reverses the phase change, enabling easy removal of the gel with trapped particles. This parameter-based control simplifies the overall cleaning process.
2Reliability
If multiple solutions (peeling solution and dissolving solution) are supplied to remove the film forming layer, then particles are removed, but the process becomes complicated and expensive materials are used
Solution Approach 1:
The patent uses a single thermoreactive polymer solution that undergoes phase transition from liquid to gel and back to liquid. The gel state enables particle trapping and removal in one step, eliminating the need for separate peeling and dissolving solutions. This reduces both process complexity and material costs.
Solution Approach 2:
The patent combines the functions of particle trapping, film formation, and particle removal into a single thermoreactive polymer solution system. The solution performs multiple functions through phase transition: it forms a film, traps particles when gelled, and allows easy removal when liquefied. This merging of functions replaces the conventional multi-solution approach.
3Reliability
If the cleaning solution is heated to volatilize components, then the film forms and traps particles, but high temperature of 100°C or more is required
Solution Approach 1:
The patent utilizes the phase transition temperature of the thermoreactive polymer, which is lower than 100°C. By heating to this specific transition temperature, the polymer transforms from liquid to gel state, forming a film that traps particles. This approach achieves effective particle trapping at lower temperatures compared to conventional volatilization methods.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances cleaning efficiency, reduces residue, and lowers costs by simplifying the process and preventing pattern damage, allowing for effective particle removal without high-temperature processes and expensive solutions.
Implementation Method 1
trapping of particles by gelling the liquid cleaning solution by phase transition through first heat treatment
Implementation Method 2
liquefying of the gel-state cleaning solution with the particle trapped therein by phase transition through second heat treatment
Data Source
AI summary
An embodiment of the present invention provides a substrate cleaning method including: supplying of a liquid cleaning solution containing a thermoreactive polymer resin in a solvent to a substrate; trapping of particles by gelling the liquid cleaning solution by phase transition through first heat treatment; liquefying of the gel-state cleaning solution with the particle trapped therein by phase transition through second heat treatment; and removing of the liquefied cleaning solution by supplying a rinse solution.