Thin Film Deposition Apparatus for Large OLED Patterning
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Solution Overview
Problem
Conventional fine metal mask (FMM) deposition methods are unsuitable for manufacturing large-sized organic light-emitting display devices due to mask distortion from gravity, which hinders high-definition patterning and mass production.
Innovation Solution
A thin film deposition apparatus with a patterning slit sheet and second barrier plate, featuring a honeycomb structure, allows for continuous deposition while the substrate or apparatus moves relative to each other, reducing shadow zones and enabling high-definition patterning on large substrates without the need for large, cumbersome masks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a large fine metal mask is used for deposition on large-sized substrates, then the substrate area coverage is improved, but the mask bends due to its own gravity causing pattern distortion
Solution Approach 1:
The patent divides the large substrate into multiple smaller deposition regions, each covered by a separate small mask. The mask assembly includes multiple masks arranged in an array, where each mask corresponds to a specific deposition region. This segmentation allows each individual mask to maintain its structural integrity and pattern accuracy while collectively covering the entire large substrate area.
2Ease of manufacture
If a conventional FMM deposition method is used, then the deposition process is simple, but it is not suitable for mass production of large-sized devices
Solution Approach 1:
The patent combines multiple deposition sources with multiple masks into a single integrated mask assembly. The mask assembly includes a support substrate with multiple masks arranged in an array, and multiple deposition sources are positioned to deposit materials through respective masks onto corresponding regions of the target substrate. This merging enables simultaneous deposition on multiple regions, achieving mass production capability while maintaining process simplicity.
3Productivity
If a large mask is used to cover the entire substrate, then the deposition efficiency is improved, but the mask distortion from gravity reduces patterning quality
Solution Approach 1:
The patent segments the single large mask into multiple smaller masks arranged in an array on a support substrate. Each small mask maintains its structural rigidity and prevents pattern distortion, while the collective array of masks covers the entire large substrate area. The support substrate holds all masks in precise positions, enabling simultaneous deposition across all regions without the gravitational distortion problems associated with large single masks.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the production of large-sized organic light-emitting display devices with high-definition patterning and improved manufacturing efficiency by maintaining pattern accuracy and reducing substrate defects, facilitating mass production.
Implementation Method 1
a deposition source configured to discharge a deposition material
Implementation Method 2
a thin film material is deposited over the FMM in order to form the thin layer having the desired pattern
Data Source
AI summary
A thin film deposition apparatus that is suitable for manufacturing large-sized display devices on a mass scale and that can be used for high-definition patterning, a method of manufacturing an organic light-emitting display device by using the thin film deposition apparatus, and an organic light-emitting display device manufactured by using the method. The thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; a first barrier plate assembly including a plurality of first barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, and that partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces; and a second barrier plate disposed at one side of the patterning slit sheet, wherein an inner part of the second barrier plate is partitioned into a plurality of spaces by a plurality of barrier ribs.