Thin Film Penetration Depth Measurement Using Disposable Insert
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Solution Overview
Problem
Conventional methods for testing and quantifying the conformality of thin films in semiconductor substrate processing, such as atomic layer deposition (ALD), are time-consuming and expensive, involving complex sample preparation and microscopy analysis.
Innovation Solution
A method involving an insert with grooves that forms spaces between the insert and a substrate, allowing precursor feeding into these spaces to determine penetration depth, which can be measured by analyzing the thin film coating formed on the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional testing procedures (fabricating test samples, SEM/TEM imaging) are used to determine thin film conformality, then measurement precision is improved, but loss of time and manufacturing cost increase significantly
Solution Approach 1:
The invention creates a simplified test structure copy (test cavity with insert) that replicates the essential geometry needed for conformality assessment without requiring complex sample preparation. The test cavity mimics the critical features of actual device structures, allowing rapid evaluation using simpler optical microscopy instead of expensive SEM/TEM while maintaining sufficient measurement precision for process control
Solution Approach 2:
The test structure uses a disposable or easily replaceable insert that can be quickly changed between tests. This eliminates the need for expensive, time-consuming sample preparation and allows multiple rapid measurements. The insert acts as a consumable test artifact that simplifies the overall measurement process and reduces both time and cost
2Measurement precision
If conventional testing procedures are used to determine thin film conformality, then measurement precision is improved, but manufacturing cost increases significantly
Solution Approach 1:
The invention creates a simplified test structure copy (test cavity with insert) that replicates the essential geometry needed for conformality assessment without requiring complex sample preparation. The test cavity mimics the critical features of actual device structures, allowing rapid evaluation using simpler optical microscopy instead of expensive SEM/TEM while maintaining sufficient measurement precision for process control
Solution Approach 2:
The test structure uses a disposable or easily replaceable insert that can be quickly changed between tests. This eliminates the need for expensive, time-consuming sample preparation and allows multiple rapid measurements. The insert acts as a consumable test artifact that simplifies the overall measurement process and reduces both time and cost
3Measurement precision
If conventional testing procedures are used for process control, then measurement precision is improved, but productivity decreases due to extended downtime
Solution Approach 1:
The invention creates a simplified test structure copy (test cavity with insert) that replicates the essential geometry needed for conformality assessment without requiring complex sample preparation. The test cavity mimics the critical features of actual device structures, allowing rapid evaluation using simpler optical microscopy instead of expensive SEM/TEM while maintaining sufficient measurement precision for process control
Solution Approach 2:
The test structures are prepared in advance as part of the standard wafer set, with inserts already in place. This preliminary preparation eliminates the need for post-deposition sample fabrication and preparation, allowing immediate measurement after deposition. The test cavities are pre-configured to receive the deposition, so no additional processing steps are needed before measurement
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables faster and more cost-effective process control and monitoring of thin film deposition, reducing downtime and allowing for more agile adjustments to the deposition process.
Implementation Method 1
The precursor(s) enter the spaces via diffusion
Implementation Method 2
feeding the precursor(s) into the formed spaces by using an atomic layer deposition (ALD) sequence
Data Source
AI summary
A method for determining penetration depth of a thin film process precursor, comprising providing an insert (100), arranging the insert (100) to contact a substrate (200) to form a plurality of spaces (101) in between the insert (100) and the substrate (200), and feeding the precursor(s) into the formed spaces (101) to determine the penetration depth of the precursor.


