Thin-Film Transistor Active Layer Screening for Faster Design

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Solution Overview

Problem

Current methods for designing thin film transistors are time-consuming and costly, and struggle to predict and optimize device characteristics due to the complexity of factors affecting their performance, limiting the development and market dominance of these devices.

Innovation Solution

A high throughput integrated calculation method that calculates characteristic parameters, screens materials, simulates device performance, and iteratively selects active layer materials until preset requirements are met, using an automated design process to achieve superior comprehensive performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If experimental methods are used to improve thin film transistor performance, then device characteristics can be optimized, but development time and costs increase significantly

Engineering Contradiction:
Improvedevice characteristicsVSAvoiddevelopment time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent applies preliminary action by establishing a comprehensive database of material parameters and device structures before actual device fabrication. This pre-collection and organization of data enables rapid screening and prediction of optimal materials and structures, avoiding time-consuming trial-and-error experiments during the development phase.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent implements feedback mechanisms through iterative optimization processes where device performance data is continuously fed back into the database. This feedback loop allows the system to learn from previous results and progressively improve material selection and device design, reducing development time while maintaining high reliability.

Inventive Principle:
Principle #23Feedback

2Loss of time

If theoretical methods are used to predict device characteristics, then research process is shortened, but comprehensive description of device characteristics is insufficient

Engineering Contradiction:
Improveresearch processVSAvoiddevice characteristics description
Core Design Contradiction:
Loss of timeVSMeasurement precision

Solution Approach 1:

The patent merges theoretical methods with experimental data by integrating computational predictions with measured device characteristics. The database combines theoretically calculated material parameters with experimentally verified device performance, creating a hybrid approach that maintains both speed and accuracy in characterizing thin film transistor devices.

Inventive Principle:
Principle #5Merging (Combining)

3Adaptability or versatility

If diverse materials are used to manufacture thin film transistors, then manufacturing flexibility increases, but device reliability and durability decrease

Engineering Contradiction:
Improvematerial selection flexibilityVSAvoiddevice durability
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The patent applies parameter changes by systematically varying material parameters within the database to identify optimal combinations that balance flexibility and reliability. By establishing parameter thresholds and performance criteria, the system can screen materials to ensure they meet minimum reliability standards while maintaining diverse material options for different application requirements.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20240005077A1Method of designing thin film transistor
Publication Date: 2024.01.04 INST OF MICROELECTRONICS CHINESE ACAD OF SCI LTD
  • US20240005077A1 patent drawing
  • US20240005077A1 patent drawing

AI summary

A method of designing a thin film transistor device, including: calculating characteristic parameters of searched materials; screening the materials according to a characteristic parameter threshold to obtain first active layer materials; simulating the first active layer material as an active layer material in a thin film transistor device model to obtain a device characteristic of the thin film transistor device; screening the first active layer materials according to a device characteristic threshold to obtain second active layer materials; taking the second active layer material as the active layer material of the thin film transistor device to perform an experiment; and selecting another second active layer material to perform the experiment once again when an experiment result does not meet a preset requirement, and a design of the thin film transistor device is completed until the experiment result meets the preset requirement.