Transparent Thin-Film VCSEL Electrode for Shorter Current Paths
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Solution Overview
Problem
Existing surface-emitting laser devices with metal electrode layers suffer from long current paths, unconcentrated currents, and high internal resistance, which reduce the efficiency of photon excitation and light emission due to blockage and increased resistance.
Innovation Solution
A surface-emitting laser device utilizing a transparent conductive thin film structure with a filling and covering part, replacing the traditional metal electrode, allowing for shorter current injection paths and improved light transmission, comprising a first mirror layer, active layer, P-type conductive layer, insulating layer, and a second mirror layer, with the thin film structure providing conductivity and light transmission.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a metal electrode layer is used to connect to the P-type conductive layer, then electrical connection is achieved, but the current path becomes long and internal resistance increases, reducing photon excitation efficiency
Solution Approach 1:
The patent replaces the traditional metal electrode layer with a transparent conductive thin film (such as ITO - indium tin oxide). This thin film maintains electrical conductivity while being optically transparent, allowing excited photons to pass through without blockage. The thin film structure reduces the current path length and internal resistance compared to conventional metal electrodes, thereby improving photon excitation efficiency while maintaining reliable electrical connection to the P-type conductive layer.
2Power
If a metal electrode layer is used, then current injection is achieved, but the electrode blocks excited photons and reduces light emission
Solution Approach 1:
The transparent conductive thin film serves as the electrode that replaces the opaque metal electrode layer. This thin film enables current injection into the active layer while simultaneously allowing excited photons to transmit through it without significant absorption or blockage. The optical transparency of the thin film material resolves the contradiction between achieving effective current injection and maintaining high light emission intensity.
3Reliability
If a traditional metal electrode is used, then electrical connection is provided, but the internal resistance is large affecting current transmission
Solution Approach 1:
The patent changes the material parameters of the electrode by using a transparent conductive oxide (such as ITO) instead of traditional metal. This material substitution reduces the resistivity parameter of the electrode layer, thereby improving current transmission efficiency. The thin film structure also reduces the thickness parameter, further lowering the overall resistance and improving current injection efficiency into the active layer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances luminous efficiency by concentrating current and reducing internal resistance, allowing for improved light emission and resonance without blocking the laser beam, thus addressing the limitations of traditional metal electrode layers.
Implementation Method 1
The thin film structure has conductivity and light transmission
Implementation Method 2
The thin film structure has conductivity
Implementation Method 3
the upper and lower distributed Bragg reflectors are used to form optical resonance (where photons are reflected back and forth in the chamber between the upper and lower distributed Bragg reflectors)
Implementation Method 4
the upper and lower distributed Bragg reflectors are used to form optical resonance (where photons are reflected back and forth
Data Source
AI summary
A surface-emitting laser device with a conductive thin film includes a first mirror layer, an active layer, a P-type conductive layer, an insulating layer, a thin film structure and a second mirror layer. The active layer is located on the first mirror layer. The P-type conductive layer is located on a surface of a part of the active layer. The insulating layer is located on the first mirror layer and covers the P-type conductive layer, and the insulating layer is provided with a light-emitting hole corresponding to the P-type conductive layer. The thin film structure has conductivity and light transmission. The thin film structure includes a filling part and a covering part. The filling part fills the light-emitting hole and the covering part is located on the insulating layer. The second mirror layer is located on the thin film structure and corresponds to the light-emitting hole.


