Thin Metal Mask Substrate Roughening for High-Definition Deposition
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Solution Overview
Problem
Current metal masks used in vapor deposition for high-definition organic EL displays and other devices face challenges in achieving precise film formation due to thickness limitations and adhesion issues, leading to reduced form accuracy and increased complexity in handling fragile masks.
Innovation Solution
A method for manufacturing a metal mask substrate involving a rolled metal sheet with a thickness of 10 μm or less, where at least one surface is etched to a surface roughness of 0.2 μm or more using an acidic etching liquid, and a resist layer is formed on the roughened surface to create a high-definition mask with through-holes, reducing shadow effects and improving adhesion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the metal mask substrate thickness is reduced to achieve high-definition film formation, then the shadow effect is minimized and definition is improved, but the mask becomes more fragile and handling becomes difficult
Solution Approach 1:
The patent divides the metal mask substrate into a laminate structure consisting of a metal mask layer and a support layer. The support layer provides mechanical strength and handles fragility, while the thin metal mask layer (5-10 μm) maintains high-definition film formation capabilities. This segmentation allows each layer to fulfill its specific function without compromise.
Solution Approach 2:
The patent employs a composite material structure where a metal mask layer is laminated onto a support layer. The support layer (such as polyimide or other rigid materials) provides mechanical strength and dimensional stability, while the metal mask layer provides the required precision for vapor deposition. This composite approach resolves the contradiction between thinness for precision and thickness for strength.
2Manufacturing precision
If the metal mask substrate thickness is reduced to minimize shadow effect, then high-definition film formation is achieved, but the mask handling complexity increases
Solution Approach 1:
By segmenting the mask into a functional metal layer and a structural support layer, the patent enables the thin metal layer to provide high form accuracy while the support layer provides ease of handling. The support layer acts as a handle during processing and installation, eliminating the difficulty of manipulating ultra-thin metal masks.
Solution Approach 2:
The support layer serves as an intermediary that facilitates handling of the thin metal mask layer. During manufacturing, transport, and installation, the support layer provides a manageable structure, while the metal layer maintains its precision function. The support layer mediates between the operational requirements and the precision requirements.
3Reliability
If acidic etching is used to create surface roughness for improved adhesion, then resist layer adhesion is enhanced, but the processing complexity increases
Solution Approach 1:
The patent changes the surface parameter of the metal mask layer by applying acidic etching to create controlled roughness. This surface modification increases the surface area and provides mechanical interlocking for the resist layer, significantly improving adhesion. The etching process parameters (acid concentration, etching time, temperature) are optimized to achieve the desired roughness while controlling processing complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables high-definition film formation with improved form accuracy and reduced complexity in handling, while maintaining the fragility of the thin metal mask, by enhancing adhesion and minimizing the impact of residual metal oxides on the mask's surface.
Implementation Method 1
reducing a thickness of the rolled metal sheet to 10 μm or less by etching the object to be processed by 3 μm or more by use of an acidic etching liquid
Data Source
AI summary
A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.