Composite Charged Particle Beam Apparatus with Tiltable Ion Column
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Solution Overview
Problem
Conventional composite charged particle beam apparatuses face interference issues between the SEM and ion beam columns due to their close arrangement, which limits the working distance and prevents detection of certain charged particles or X-rays.
Innovation Solution
A composite charged particle beam apparatus that allows adjustable working distance by moving the sample stage and ion beam column relative to the sample chamber, enabling flexible positioning to optimize observation and processing based on the purpose.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the tip of the SEM column and the sample are arranged close to each other to achieve high resolution observation, then observation resolution is improved, but the tip of the SEM column interferes with the tip of the ion beam column or gas nozzle, and charged particles or X-rays generated from the sample are prevented from reaching the detector
Solution Approach 1:
The patent introduces a new degree of freedom by enabling the ion beam column to tilt relative to the electron beam column. This dimensional change allows the system to adjust the spatial relationship between columns and detectors, resolving the interference problem while maintaining observation resolution. The tilting mechanism creates additional spatial dimensions for positioning components without compromising the perpendicular arrangement needed for high-resolution SEM observation.
Solution Approach 2:
The patent implements dynamic adjustability in the ion beam column's orientation and position relative to the sample and electron beam column. By making the ion beam column tiltable and repositionable, the system can dynamically adapt its configuration to avoid interference with the SEM column tip while still enabling effective ion beam processing and maintaining proper detector positioning for charged particle and X-ray detection.
2Stability of the object's composition
If the ion beam column is fixed in position to maintain stable processing, then processing stability is improved, but the working distance of the electron beam column cannot be adjusted for different observation purposes
Solution Approach 1:
The patent transforms the ion beam column from a fixed component to a dynamically adjustable one. The ion beam column can now be tilted and repositioned along the electron beam direction, allowing the working distance of the electron beam column to be adjusted for different observation purposes while maintaining stable ion beam processing when needed. This dynamic capability enables the system to adapt between different operational modes without compromising processing stability.
Solution Approach 2:
The patent enhances the versatility of the composite charged particle beam apparatus by enabling the ion beam column to serve multiple functions: it can be positioned for stable processing when high processing stability is needed, or tilted and repositioned when working distance adjustment is required for different observation purposes. This multi-functionality allows a single apparatus to handle diverse observation and processing requirements effectively.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-resolution observation and processing with adjustable working distance, allowing for detection of backscattered electrons and X-rays that were previously inaccessible, improving the apparatus's observational capabilities.
Implementation Method 1
an electron beam column (1) configured to irradiate a sample (7) with an electron beam (8)
Implementation Method 2
an ion beam column (2) configured to irradiate the sample (7) with an ion beam (9) to perform etching processing
Implementation Method 3
a detector (4, 5) configured to detect a charged particle generated from the sample (7)
Data Source
AI summary
Provided is a composite charged particle beam apparatus, including: an electron beam column for irradiating a sample with an electron beam; an ion beam column for irradiating the sample with an ion beam to perform etching processing; a sample stage drive portion for moving a sample stage in an irradiation axis direction of the electron beam; and a column adjusting portion for moving the ion beam column relatively to a sample chamber such that the sample is irradiated with the ion beam at a position irradiated with the electron beam.