Tiltable Shutter Plate for Imprint Alignment Accuracy
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Solution Overview
Problem
Current imprint techniques face challenges in achieving high alignment accuracy due to low viscoelasticity of imprint materials during alignment, which can be improved by precise adjustment of exposure amounts in preceding exposure processes.
Innovation Solution
An imprint apparatus with a shutter plate and an adjuster that controls light irradiation to the imprint material, allowing for adjustable tilt of the shutter plate to selectively expose portions of the imprint material, thereby increasing viscoelasticity and improving alignment accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If preceding exposure is performed to increase viscoelasticity of imprint material, then alignment accuracy is improved, but exposure amount control precision is insufficient
Solution Approach 1:
The shutter plate is made tiltable to dynamically adjust the exposed area of imprint material. By changing the tilt angle, the light irradiation area can be precisely controlled, enabling accurate exposure amount adjustment for preceding exposure processes, thereby improving alignment accuracy without sacrificing control precision.
Solution Approach 2:
The patent changes the physical parameter of the shutter plate from fixed to tiltable, allowing continuous adjustment of the light irradiation area. This parameter change enables precise control of exposure amounts by varying the tilt angle, directly addressing the need for better exposure control precision while maintaining improved alignment accuracy.
2Manufacturing precision
If fixed shutter plate is used for light irradiation, then device structure is simple, but exposure area cannot be precisely controlled
Solution Approach 1:
The shutter plate is designed to be tiltable rather than fixed, introducing a dynamic adjustment capability. This allows the exposed area to be precisely controlled by adjusting the tilt angle, achieving better exposure area control precision while adding only minimal mechanical complexity through a tilt adjustment mechanism.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The adjustable shutter plate mechanism enhances alignment accuracy by allowing for precise control of exposure amounts, reducing relative positional shifts between the substrate and mold, and maintaining high filling properties, thus improving overall imprint process efficiency.
Implementation Method 1
curing an imprint material on the shot region by light irradiation
Implementation Method 2
forms a pattern on a shot region of a substrate by curing an imprint material on the shot region by light irradiation
Data Source
AI summary
Provided is an imprint apparatus that forms a pattern on a shot region of a substrate by curing an imprint material on the shot region by light irradiation in a state in which the imprint material is in contact with a mold. The apparatus comprises a shutter plate, and an adjuster configured to adjust a state of the shutter plate to control the light irradiation to the imprint material on the shot region, wherein the shutter plate includes a first passing portion used to irradiate a portion of an entire portion of the imprint material on the shot region with light, and the adjuster adjusts a tilt of the shutter plate.