Tilted Channel Region for High PPI Display Array Substrate
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Solution Overview
Problem
High PPI display panels face challenges in achieving stable light exposure and high pixel aperture ratios due to the limitations of line width and spacing in the lithography process, leading to poor exposure and production efficiency.
Innovation Solution
The array substrate design includes a thin film transistor with a channel region where the active layer and gate overlap, forming a channel region with edges that are tilted at an angle greater than 0° and less than or equal to 40°, which reduces the relative length of film layers and increases exposure stability and aperture ratios.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the line width and spacing between adjacent sub-pixels are reduced to increase PPI, then the pixel density is improved, but the exposure stability deteriorates due to process technology constraints
Solution Approach 1:
The channel region is designed with an asymmetric orientation where its extending direction forms an angle of 0° to 40° with respect to the first direction (parallel to data lines). This asymmetric angular arrangement reduces the relative length of patterns in the exposure process, thereby improving exposure stability while maintaining high pixel density
Solution Approach 2:
The invention changes the angular parameter of the channel region's extending direction relative to the data lines, setting it within 0° to 40°. This parameter adjustment optimizes the exposure process by reducing pattern length, thus resolving the contradiction between high PPI and exposure stability
2Area of stationary object
If the line width is reduced to increase pixel aperture ratio, then the light passing efficiency is improved, but the manufacturing precision deteriorates due to lithography process limits
Solution Approach 1:
The channel region is oriented at an asymmetric angle of 0° to 40° relative to the data lines, which reduces the projected pattern length in the exposure direction. This allows for larger aperture ratios without compromising lithography exposure quality
Solution Approach 2:
The invention introduces an angular dimension to the channel region orientation, tilting it relative to the data lines. This dimensional change in orientation reduces the effective pattern length in the critical exposure direction, enabling better lithography performance at larger aperture ratios
Data Source
AI summary
The present disclosure discloses an array substrate, a display panel and a display device. The array substrate comprises a substrate; a plurality of scanning lines and a plurality of data lines located on one side of the substrate, the plurality of scanning lines are extended in a second direction, the plurality of data lines are extended in a first direction, the plurality of scanning lines intersect the plurality of data lines in an insulated manner; and a plurality of sub-pixels defined by the plurality of scanning lines and the plurality of data lines; where each of the plurality of sub-pixels includes a thin film transistor which comprises an active layer, a gate, a source and a drain, the active layer, the gate, the source and the drain are located on one side of the substrate. The active layer includes a channel region.