Tin Compound Apparatus Cleaning to Prevent Stanoxane Contamination
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Tin compounds react with oxygen and water to form stanoxane compounds, which adhere to and remain on apparatuses, leading to impurities and decreased purity in subsequent synthesis or storage.
Innovation Solution
A method involving steps of cleaning an apparatus with a non-polar solvent, followed by alcohol, and then ultrapure water with a resistivity of 17 MΩ·cm, optionally including an acidic aqueous solution, to effectively remove impurities and maintain high purity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If tin compound is stored or processed in apparatus, then tin compound can be handled and processed, but stanoxane compounds form and adhere to apparatus surfaces causing impurity contamination
Solution Approach 1:
The patent applies preliminary action by performing cleaning with non-polar solvent, alcohol, and ultrapure water in sequence before the apparatus is used for storing or processing tin compounds. This preliminary cleaning removes potential contaminants and prevents stanoxane compound adhesion from occurring in the first place, thereby maintaining tin compound purity without requiring intervention after contamination occurs.
2Ease of manufacture
If conventional cleaning methods are used, then apparatus can be cleaned, but impurities remain and tin compound purity decreases
Solution Approach 1:
The patent segments the cleaning process into three distinct sequential steps: (A) cleaning with non-polar solvent to remove organic contaminants, (B) cleaning with alcohol to remove intermediate contaminants, and (C) cleaning with ultrapure water to remove inorganic contaminants and residual cleaning agents. This segmentation allows each step to target specific types of impurities, achieving high purity results while maintaining a relatively simple overall process.
3Quantity of substance
If tin compound reacts with oxygen and water, then stanoxane compounds are formed, but these compounds adhere to apparatus and contaminate subsequent tin compound batches
Solution Approach 1:
The patent converts the harmful reaction between tin compound, oxygen, and water that produces adhering stanoxane compounds into a beneficial cleaning opportunity. By deliberately introducing controlled amounts of oxygen and water through the structured cleaning sequence (non-polar solvent → alcohol → ultrapure water), the apparatus surfaces are cleaned of previous stanoxane deposits, and the final ultrapure water rinse prevents new stanoxane formation by leaving no organic residues that could catalyze the reaction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method efficiently and safely cleans the apparatus, suppressing impurity formation, ensuring high purity and preventing purity loss of tin compounds during storage or reuse.
Implementation Method 1
a step of cleaning the apparatus with a non-polar solvent
Implementation Method 2
cleaning the apparatus with a non-polar solvent
Implementation Method 3
a step of cleaning with an alcohol
Implementation Method 4
a step of cleaning with an alcohol
Implementation Method 5
a step of cleaning the apparatus with ultrapure water with a resistivity of 17 MΩ·cm at 25° C.
Implementation Method 6
a step of cleaning the apparatus with ultrapure water with a resistivity of 17 MΩ·cm at 25° C.
Implementation Method 7
a step of cleaning with an acidic aqueous solution following the step of cleaning with an alcohol
Implementation Method 8
a step of cleaning with an acidic aqueous solution
Data Source
AI summary
A method for efficiently and safely cleaning an apparatus for tin compound and a highly purified tin compound apparatus are provided. A cleaning method for an apparatus that has been in contact with a tin compound having formula (1) below includes at least steps (A) to (C), in which step (B) is performed after step (A), and step (C) is performed after step (B):(A) a step of cleaning the apparatus with a non-protic solvent,(B) a step of cleaning the apparatus with alcohol, and(C) a step of cleaning the apparatus with ultrapure water having a resistivity value of 17 MΩ·cm at 25° C.RpSnXm (1)In formula (1), R is a hydrocarbon group, p is an integer from 1 to 3, X is a hydrolyzable substituent, and m=4−p.