Tin Reuse Filtration for EUV Sources With Collector Debris Damage
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Solution Overview
Problem
The collector in laser-produced plasma (LPP) EUV radiation sources in semiconductor lithography systems is prone to damage and degradation due to particle, ion, and tin debris impact, leading to frequent maintenance and reduced efficiency.
Innovation Solution
Implementing a debris collection mechanism with rotating vanes to capture and recycle tin debris, and a tin reuse system that reuses collected tin to refill the droplet generator, reducing the need for frequent refills and maintenance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of energy
If a laser-produced plasma (LPP) system is used to generate EUV radiation, then high EUV conversion efficiency is achieved, but the collector is subjected to damage and degradation due to particle, ion, and tin deposition
Solution Approach 1:
The patent extracts and removes tin debris and particles from the system using a debris collection mechanism with rotating vanes that sweep across the vacuum chamber, preventing accumulation on the collector and other optical surfaces
Solution Approach 2:
The patent introduces a buffer gas (such as nitrogen or helium) as an intermediary medium between the plasma source and collector. This gas absorbs particles and ions, reducing their direct impact on the collector while maintaining EUV radiation transmission
2Illumination intensity
If tin droplet targets are used in LPP EUV sources, then EUV light is generated with peak emission at 13.5 nm, but tin deposition damages the collector and requires frequent maintenance
Solution Approach 1:
The patent implements continuous debris removal through rotating vanes that constantly sweep the vacuum chamber, and continuous tin recycling that maintains a steady supply of clean tin droplets, eliminating the need for periodic system shutdowns and collector replacement
Solution Approach 2:
The patent recovers tin from the vacuum chamber environment through the debris collection mechanism, melts and purifies it, then recycles it back into the droplet generator, converting waste material into a useful resource that reduces maintenance needs
3Reliability
If a debris collection mechanism with rotating vanes is implemented, then tin debris is captured and recycled, but device complexity increases
Solution Approach 1:
The rotating vanes serve multiple functions simultaneously: they sweep debris from the chamber, transport it to collection points, and can be heated to prevent condensation. This multi-functionality reduces the need for separate dedicated components for each task
Solution Approach 2:
The patent combines the debris collection function with the existing vacuum chamber structure and thermal management system, integrating multiple functions into unified components rather than adding separate independent systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces downtime, prevents collector degradation, and maintains EUV conversion efficiency by continuously recycling and purifying tin, thereby extending the operational life of the EUV radiation source.
Implementation Method 1
LPP technology produces EUV light by focusing a high-power laser beam onto small tin droplet targets to form highly ionized plasma that emits EUV radiation
Implementation Method 2
highly ionized plasma that emits EUV radiation with a peak maximum emission at 13.5 nm
Data Source
AI summary
A metal reuse system for an extreme ultra violet (EUV) radiation source apparatus includes a first metal collector for collecting metal from vanes of the EUV radiation source apparatus, a first metal storage coupled to the first metal collector via a first conduit, a metal droplet generator coupled to the first metal storage via a second conduit, and a first metal filtration device disposed on either one of the first conduit and the second conduit.