Single-Target Titanium Oxynitride Color Film Sputtering
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Solution Overview
Problem
Existing methods for forming decorative color films are costly and complex, requiring multiple targets and gases, and do not allow for easy adjustment of film color through process parameters, often resulting in insufficient sputtering efficiency and surface flatness.
Innovation Solution
A method involving a single titanium target with a gas mixture of noble and nitrogen gases, adjusting sputtering power, time, and pressure to form a single-layered titanium oxynitride film with controlled molar ratios of nitrogen to oxygen, allowing for varied colors and improved adhesivity and metallic luster.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a stack of multiple films (titanium oxynitride, titanium dioxide, silicon nitride, silicon dioxide) is sputtered to achieve desired color, then the film can have decorative color, but the cost is higher and the technique is more complicated
Solution Approach 1:
The patent merges multiple separate film deposition processes into a single titanium oxynitride film deposition process. By using one titanium target with controlled nitrogen and oxygen incorporation during sputtering, the method combines what would otherwise require multiple targets (titanium, silicon) and multiple gas introductions into a unified process that achieves similar decorative color effects with simpler equipment and操作流程.
Solution Approach 2:
The single titanium target serves multiple functions: it provides the base titanium material and, through controlled reaction with nitrogen gas during sputtering, simultaneously forms the titanium oxynitride compound layer with desired optical properties. This multi-functional approach eliminates the need for separate titanium dioxide and silicon nitride film deposition steps.
2Adaptability or versatility
If only nitrogen gas is introduced to form color silicon nitride film, then different colors can be obtained according to nitrogen gas flowrate, but a large amount of nitrogen gas causes reaction between nitrogen gas and target surface, leading to insufficient sputtering efficiency
Solution Approach 1:
The patent changes the sputtering parameters including nitrogen gas flowrate (5-50 sccm), sputtering power (50-200 W), and working pressure (2-10 mTorr) to optimize the balance between color control and deposition efficiency. By carefully controlling these parameters, the method achieves desired color variation while maintaining adequate sputtering rates, resolving the contradiction between color adaptability and productivity.
Solution Approach 2:
The method dynamically adjusts nitrogen gas flowrate and sputtering power during the deposition process to control the nitrogen content in the titanium oxynitride film. This dynamic control allows real-time adjustment of film color while maintaining process efficiency, enabling operators to optimize between color precision and deposition speed based on specific requirements.
3Productivity
If sputtering power is increased to improve deposition rate, then productivity increases, but the color control precision may be affected
Solution Approach 1:
The method incorporates feedback control by monitoring film color during deposition and adjusting sputtering parameters accordingly. By measuring the evolving optical properties of the titanium oxynitride film and modifying nitrogen flowrate or power in response, the system maintains color precision even at higher deposition rates, resolving the trade-off between productivity and manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method simplifies the process of forming color films with desired colors, achieving satisfactory adhesivity and metallic luster while reducing costs and complexity by adjusting sputtering parameters to control the molar ratio of nitrogen to oxygen in titanium oxynitride films.
Implementation Method 1
a sputtering operation is performed on the metal substrate, so as to form a single-layered titanium oxynitride film having a predetermined color over the metal substrate. The sputtering operation includes bombarding a titanium target with a gas mixture containing a noble gas and a nitrogen gas
Data Source
AI summary
The present invention provides a color film and a method of forming the same. In some embodiments, only one titanium target is used, and a flowrate of nitrogen gas, a working pressure, a sputtering power and a sputtering time are adjusted, so as to form single-layered titanium oxynitride color films having different colors and thicknesses. The color film has satisfactory adhesivity, a flat surface and metallic luster.