TLE Source Arrangement with Reflected Laser Beam
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Solution Overview
Problem
In thermal laser evaporation (TLE) systems, the use of elongated crucibles for source material evaporation leads to a confined region of high deposition rates with weak radial dependence, but requires a steeply aligned laser beam, limiting substrate space and risking unwanted coating of laser system components.
Innovation Solution
A source arrangement with a support that encloses a columnar free space, accessible through an opening, and features a mirror surface reflective to the laser beam, allowing the laser to be reflected and directed towards the source element without a direct line-of-sight, thus preventing unwanted coating of system components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a steeply aligned laser beam is used to reach the source element in an elongated crucible, then the source material can be evaporated and sublimated effectively, but the available space for the substrate is limited and unwanted coating of laser system components occurs
Solution Approach 1:
The patent changes the spatial dimension of laser beam delivery by transitioning from a direct line-of-sight approach to a reflected path. The laser beam is directed at an angle onto a mirror surface, which then reflects the beam onto the source element. This dimensional change in beam delivery allows the substrate to be positioned in the central region with adequate space, while the laser system components can be arranged away from the deposition zone, preventing unwanted coating.
2Productivity
If a steeply aligned laser beam is used to reach the source element, then evaporation can proceed, but unwanted coating of laser system components such as mirrors or entrance windows occurs
Solution Approach 1:
The patent introduces a mirror surface as an intermediary element between the laser beam and the source element. This mirror serves as a mediator that redirects the laser energy onto the source material while allowing the substrate to be positioned in the central deposition region. The mirror enables the laser system to be positioned away from the substrate, preventing direct line-of-sight coating of laser components while maintaining effective evaporation.
3Object-affected harmful factors
If an aperture is arranged in the laser beam path to prevent coating, then alignment effort and device complexity increase
Solution Approach 1:
The patent extracts the beam directionality function from the laser system itself and transfers it to a separate mirror surface. Instead of using an aperture to block or shape the beam, the mirror surface actively redirects the beam at an angle onto the source element. This extraction of the directional control function eliminates the need for complex aperture alignment mechanisms while achieving the same goal of preventing unwanted coating.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration maintains a high-density region of evaporated/sublimated source material with weak radial dependence, while preventing unintentional coating of laser system elements, thereby reducing maintenance costs and extending maintenance intervals.
Implementation Method 1
features a mirror surface reflective to the laser beam, allowing the laser to be reflected and directed towards the source element without a direct line-of-sight
Implementation Method 2
material is evaporated and/or sublimated in a controlled environment, in particular in a reaction chamber filled with a reaction atmosphere, by means of laser heating
Implementation Method 3
source material to be evaporated and/or sublimated by the laser beam
Implementation Method 4
source material to be evaporated and/or sublimated by the laser beam
Implementation Method 5
with the intent to coat a surface with a thin film
Data Source
AI summary
The invention relates to a source arrangement (10) for a TLE system (100) for providing a source element (12) comprising or consisting of a source material (14) to be evaporated and/or sublimated by a laser beam (112), comprising a support (20) carrying said source element. Further, the invention relates to a TLE system (100) comprising a laser source (110) for providing a laser beam (112), a reaction chamber (120) for containing a reaction atmosphere (124), a source arrangement (10) for providing a source element (12) comprising or consisting of a source material (14) to be evaporated and/or sublimated by the laser beam (112) within the reaction chamber (120), and a substrate arrangement (130) for providing a substrate (132) to be coated within the reaction chamber (120) with the evaporated and/or sublimated source material (14). In addition, the invention relates to a method for using a TLE system (100), the TLE system (100) comprising a laser source (110) for providing a laser beam (112), a reaction chamber (120) for containing a reaction atmosphere (124), a source arrangement (10) for providing a source element (12) comprising or consisting of a source material (14) to be evaporated and/or sublimated by the laser beam (112) within the reaction chamber (120), and a substrate arrangement (130) for providing a substrate (132) to be coated within the reaction chamber (120) with the evaporated and/or sublimated source material (14).