Selective Oxidation Patterning of 2D TMDs Nanomaterials
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Solution Overview
Problem
Current methods for patterning two-dimensional transition metal dichalcogenides (TMDs) nanomaterials, such as MoS2, are complex and expensive due to the requirement of photolithography and subsequent mask removal, which complicates the process and increases costs.
Innovation Solution
A method involving the use of different substrates like silicon dioxide, sapphire, quartz, and mica, combined with controlled annealing temperatures and pressures, to selectively etch and pattern 1-layer TMDs nanomaterials, thereby simplifying the patterning process and improving thermal stability without the need for photolithography or mask removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithography is used for patterning TMDs, then patterning capability is achieved, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent extracts and removes the photolithography step from the TMDs patterning process. By using direct growth methods on patterned substrates, the complex photolithography, mask alignment, and mask removal steps are completely eliminated, achieving patterning through a simpler substrate-based approach
Solution Approach 2:
The patent applies preliminary action by pre-patterning the substrate before TMDs growth. The substrate is prepared with specific patterns (such as etched regions or different material areas) that directly guide the subsequent TMDs growth to form the desired patterns without requiring post-growth patterning steps
2Manufacturing precision
If photolithography and mask removal are used, then patterned TMDs are obtained, but manufacturing cost increases
Solution Approach 1:
The patent removes the expensive photolithography equipment and mask materials from the process. By using substrate-based patterning with direct growth, the need for costly photolithography tools, photoresist materials, and mask fabrication is eliminated
Solution Approach 2:
The patent uses inexpensive substrate patterns (such as simple etched features or deposited layers) that serve as temporary guides during growth and can be easily removed or remain as part of the final device, replacing expensive reusable masks and photoresist materials
3Manufacturing precision
If conventional patterning methods are used, then TMDs can be patterned, but thermal stability decreases
Solution Approach 1:
The patent applies preliminary substrate preparation and growth control to create patterns directly during the growth process. This avoids post-growth processing steps that expose TMDs to harsh chemicals and mechanical stress, thereby preserving thermal stability
Solution Approach 2:
The patent replaces mechanical and chemical patterning methods (photolithography, etching) with a growth-based approach where patterns form during the TMDs synthesis process itself. This substitution eliminates the need for subsequent processing that would compromise thermal stability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the thermal stability and patterning efficiency of TMDs nanomaterials, allowing for the creation of patterned 2D TMDs without the complexity and expense of traditional methods, while maintaining the semiconductor properties of TMDs.
Implementation Method 1
annealing the preform in a tube furnace filled with air at atmospheric pressure, the annealing temperature ranges from 250° C. to about 290° C., so that the first portion of the 1-layer MoS2 12 is removed by oxidation
Data Source
AI summary
A method for making patterned two dimensional (2D) transition metal dichalcogenides (TMDs) nanomaterials is disclosed. The method includes making a substrate, wherein the substrate has a substrate surface including a first portion surface and a second portion surface, the first portion surface is formed by oxide or nitride, and the second portion surface is formed by mica; applying a mono 2D TMDs nanomaterials; annealing the mono 2D TMDs nanomaterials and the substrate in an oxygen containing gas, the annealing temperature is controlled so that only the part of the 2D TMDs nanomaterials, that is on the second portion surface, is removed by oxidization, and the other part of the 2D TMDs nanomaterials, that is on the first portion surface, is remained to form the patterned 2D TMDs nanomaterials.