TMR Touch Panel Manufacturing via Segmented Photolithography
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Solution Overview
Problem
Conventional touch sensing panels using TMR elements require frequent refresh operations due to their memory characteristics, and the extensive photolithography process increases manufacturing costs and time.
Innovation Solution
A method of manufacturing a touch sensing panel that removes the memory characteristic of TMR patterns by forming intersecting and coupling regions with specific widths and shapes, reducing the need for refresh operations and minimizing the photolithography process to two mask steps, thereby reducing manufacturing costs and time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If TMR elements with memory characteristics are used in touch sensing panels, then data retention capability is improved, but refresh operations are required which reduce operating speed
Solution Approach 1:
The patent extracts the memory characteristic from the TMR element by designing the free layer with specific magnetic anisotropy that prevents magnetization state retention. The free layer is configured to have in-plane magnetic anisotropy rather than perpendicular magnetic anisotropy, which eliminates the memory effect while preserving the TMR sensing functionality. This allows the touch panel to operate without refresh operations.
2Manufacturing precision
If extensive photolithography processes are used to form precise TMR patterns, then manufacturing precision is improved, but manufacturing cost and time increase
Solution Approach 1:
The patent segments the photolithography process into only two essential mask steps: first forming the electrode patterns, then forming the TMR element patterns. This segmentation eliminates unnecessary intermediate lithography steps while maintaining precise pattern formation through optimized mask design and direct patterning methods.
Solution Approach 2:
The patent performs preliminary preparation of the substrate and electrode structures before TMR element formation, ensuring that subsequent photolithography steps can be completed with minimal additional processing. The substrate is pre-configured with appropriate buffer layers and electrode patterns that facilitate direct TMR element deposition and patterning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-speed operation of touch sensing panels without the need for refresh operations and decreases manufacturing costs and time by simplifying the photolithography process, resulting in a more efficient and cost-effective production method.
Implementation Method 1
forming a photoresist layer on the plurality of first electrodes, forming a plurality of photoresist removing regions positioned to intersect the first electrodes
Implementation Method 2
A tunneling magnetoresistance (TMR) element in which the tunneling effect of electrons is used is most spotlighted as the material of a magnetic random access memory (MRAM) or a high density magnetic recording head
Data Source
AI summary
A method of manufacturing a touch sensing panel includes providing a substrate, forming a plurality of first electrodes arranged on the substrate, the first electrodes being separated from each other, forming a photoresist layer on the plurality of first electrodes, forming a plurality of photoresist removing regions positioned to intersect the first electrodes and to be separated from each other on the photoresist layer, and forming a tunneling magnetoresistance (TMR) element layer and a second electrode layer comprising a plurality of second electrodes on the photoresist layer. The method provides a touch sensing panel capable of being driven at high speed and reduces manufacturing cost and time.