Top Hat Beam Shaping with Field Correction for Non-TEM00 Lasers

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Solution Overview

Problem

Existing beam shaping technologies struggle to produce high-quality top hat beams efficiently and cost-effectively, particularly when dealing with non-TEM00 Gaussian beams from common laser sources like laser diodes, due to limitations in flexibility, customization, and manufacturing costs of diffractive elements, and inefficiencies in beam integration and refractive solutions.

Innovation Solution

An optical beam shaping device comprising an electrical field corrector and a top hat field mapper, where the electrical field corrector alters the light beam's electrical field to a predetermined mapper-input profile, followed by the top hat field mapper, which converts it into a top hat profile, using components such as apodization filters and acylindrical lenses to achieve uniformity and efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If diffractive optics are used to convert arbitrary input beams to top hat profiles, then beam shaping flexibility is improved, but manufacturing cost increases and higher order diffraction causes power loss

Engineering Contradiction:
Improvebeam shaping flexibilityVSAvoidpower loss from higher order diffraction
Core Design Contradiction:
Adaptability or versatilityVSLoss of energy

Solution Approach 1:

The beam shaping process is divided into two independent stages: first converting the arbitrary input beam to a TEM00 Gaussian mode, then converting that Gaussian beam to a top hat profile. This segmentation allows each stage to be optimized independently, reducing higher order diffraction effects in the final conversion stage.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The input beam is pre-converted to a TEM00 Gaussian profile before the final top hat conversion. This preliminary action ensures that the beam entering the top hat converter has the optimal profile, minimizing higher order diffraction and improving overall efficiency.

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If beam integration methods are used to create top hat profiles, then uniformity is improved, but device complexity and setup cost increase

Engineering Contradiction:
Improvebeam uniformityVSAvoidsetup complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the complex beam integration stage from the system. Instead of using multiple beamlets that require precise alignment and overlapping, the invention directly converts the input beam through a simplified two-stage process, removing the problematic integration step while maintaining uniformity.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The invention replaces expensive, complex beam integration optics with simpler, more cost-effective components that achieve the same uniformity goal through a different approach, reducing both equipment cost and setup complexity.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

3Ease of manufacture

If refractive field mappers are used for top hat conversion, then manufacturing is simplified, but they cannot handle non-TEM00 input beams effectively

Engineering Contradiction:
Improvelens manufacturing simplicityVSAvoidinput beam compatibility
Core Design Contradiction:
Ease of manufactureVSAdaptability or versatility

Solution Approach 1:

The first optical element is designed with universal functionality to accept various non-TEM00 input beam profiles and convert them to a standardized TEM00 Gaussian profile. This universal converter can handle different input types (Gaussian, top hat, uniform, or other profiles) making the system adaptable while keeping subsequent components simple.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent changes the beam parameters (profile, mode structure) in the first stage to transform arbitrary input beams into a canonical TEM00 form. This parameter transformation enables the second stage to use simpler optics designed for a specific input profile, combining versatility with manufacturing simplicity.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device effectively transforms various initial beam profiles into high-quality top hat beams with improved uniformity and efficiency, reducing power requirements and minimizing image distortions, suitable for applications like material processing and microscopy.

Implementation Method 1

an electrical field corrector configured to alter an electrical field of the light beam along said transverse axis to convert the initial profile of the light beam into a predetermined mapper-input profile

Methodology Applied
Scientific EffectPhase modulation: Phase Modulation

Implementation Method 2

a top hat field mapper configured to convert light distribution along said transverse axis from the predetermined mapper-input profile to said top hat profile

Methodology Applied
Scientific EffectSpatial transformation:

Implementation Method 3

In some implementations, the electrical field corrector comprises an apodization filter

Methodology Applied
Scientific EffectOptical absorption: Absorption (EM radiation)

Implementation Method 4

using components such as apodization filters and acylindrical lenses to achieve uniformity and efficiency

Methodology Applied
Scientific EffectRefraction: Refraction

Data Source

PatentUS20260029655A1Top hat optical beam shaping device
Publication Date: 2026.01.29 OSELA INC
  • US20260029655A1 patent drawing
  • US20260029655A1 patent drawing
  • US20260029655A1 patent drawing

AI summary

An optical beam shaping device for transforming the spatial profile of a light beam into a top hat profile is provided. The optical beam shaping device includes two main components, both provided across the path of the light beam, in any order: an electrical field corrector and a top hat field mapper. The electrical field corrector is configured to alter the electrical field of the light beam along a transverse axis to convert the initial profile of the light beam into a predetermined mapper-input profile. The top hat field mapper is configured to convert light distribution along the transverse axis from the predetermined mapper-input profile to the top hat profile. In some implementations, the initial profile of the light beam is corrected from its original, non-TEM00 shape to a shape better suited to yield a quality top hat profile through the top hat field mapper.