Integrated Top Lid Support for Thermal Sag in Substrate Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The top lid of substrate processing apparatuses sag due to negative pressure and thermal deformation, leading to non-uniform gas flow and plasma distribution, and increase device complexity.
Innovation Solution
The top lid is integrated with a support formed from the same material, featuring a cross-shaped design with symmetric protrusions to minimize thermal deformation, and lacks separate connection devices, maintaining a constant distance between gas supply units and substrate supports.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If a support is installed in a vertical direction between the chamber wall and the top lid to prevent sagging, then the top lid deformation is reduced, but the device complexity increases and interference may occur between reactors during substrate transfer
Solution Approach 1:
The support is integrated into the top lid as an integral structure rather than being a separate component. The support protrudes from the upper surface of the top lid and is formed as a single piece with the top lid itself, eliminating the need for separate connection devices and reducing device complexity while maintaining the sagging prevention function
Solution Approach 2:
The integrated support structure serves multiple functions: it provides mechanical support to prevent top lid sagging under vacuum pressure, maintains the structural integrity of the top lid, and eliminates the need for separate connection devices. This multi-functional design reduces the overall device complexity
2Stability of the object's composition
If the top lid is made thicker to prevent thermal deformation, then the thermal stability is improved, but the weight and device complexity increase
Solution Approach 1:
Instead of uniformly increasing the thickness of the entire top lid, the support structure is strategically positioned at specific locations where thermal deformation and vacuum pressure effects are most pronounced. The support protrudes from the upper surface at key structural points, providing localized reinforcement that prevents thermal deformation without adding excessive weight throughout the entire top lid
Solution Approach 2:
The top lid and support are formed as an integral structure from the same material, ensuring uniform thermal expansion properties and eliminating interface issues. This integrated design provides optimal thermal stability while maintaining weight efficiency through the strategic placement of support structures
3Strength
If connection devices are used to attach the support to the top lid, then the support can be securely fixed, but the device complexity increases and thermal expansion differences may cause connection failures
Solution Approach 1:
The support and top lid are formed as a single integral structure without any connection devices. The support protrudes directly from the upper surface of the top lid as part of the same piece, eliminating grooves, fasteners, or other connection mechanisms. This integration ensures perfect thermal expansion compatibility and eliminates connection failure risks while reducing device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The integrated support design maintains a consistent reaction space distance, ensuring uniform gas flow and plasma distribution, reducing device complexity and process defects.
Implementation Method 1
the top lid 3 may sag due to a negative pressure (i.e., vacuum suction power) of the inner space 8 generated by the exhaust unit (not shown) such as a vacuum pump
Implementation Method 2
when a substrate is processed at a high temperature, the top lid 3 may further sag due to thermal deformation
Data Source
AI summary
A top lid capable of minimizing thermal deformation when a substrate processing temperature increases includes a support for supporting the top lid, the support protruding integrally from one surface of the top lid.