Topical Acid Composition for Onychomycosis pH Reduction

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Solution Overview

Problem

Current treatments for onychomycosis fail to effectively address the alkaline environment created by fungi in the nail, which favors fungal multiplication, as they do not adequately lower the pH to inhibit fungal growth.

Innovation Solution

A topical composition comprising a physiologically acceptable carboxylic acid, such as lactic acid or acetic acid, in combination with a C1-C4 alkyl ester as a carrier, is applied to reduce the skin and nail pH to a range of 1.5-4.5, disrupting fungal growth by creating an unfavorable environment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional anti-fungal treatments are used, then fungal infection is targeted, but the alkaline environment created by fungi is not effectively addressed, allowing continued fungal multiplication

Engineering Contradiction:
Improveeffectiveness of anti-fungal treatmentVSAvoidalkaline environment favoring fungal growth
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent applies parameter changes by modifying the pH parameter of the nail environment. Lactic acid is used to shift the pH from alkaline (favorable for fungal growth) to acidic (inhibitory to fungal growth). This directly addresses the harmful alkaline environment created by fungi while treating the infection, resolving the contradiction between targeting fungal infection and addressing the alkaline environment.

Inventive Principle:
Principle #35Parameter changes

2Object-affected harmful factors

If strong acids are used to lower pH, then fungal growth is inhibited, but skin tolerance and safety become problematic

Engineering Contradiction:
Improvefungal growth inhibitionVSAvoidskin irritation from acid
Core Design Contradiction:
Object-affected harmful factorsVSObject-generated harmful factors

Solution Approach 1:

The patent uses parameter changes by selecting lactic acid, a mild organic acid that can effectively lower pH to inhibit fungal growth while being well-tolerated by skin. This differs from strong inorganic acids by changing the type and strength of the acid parameter, achieving fungal inhibition without excessive skin irritation.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs lactic acid, which is naturally present in the skin and rapidly metabolized, making it a safe, biocompatible choice that minimizes cumulative irritation while effectively creating the acidic environment needed to inhibit fungal growth.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

3Reliability

If pH lowering agents are applied topically, then fungal multiplication is hampered, but maintaining stable pH levels proves difficult

Engineering Contradiction:
Improveinhibition of fungal multiplicationVSAvoidpH stability in treated area
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent applies lactic acid topically to maintain continuous acidic conditions in the nail environment. By repeated application, the composition ensures continuous pH lowering, preventing the environment from returning to alkaline levels that would favor fungal growth, thus maintaining stable inhibition of fungal multiplication.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition effectively hampers the development and treatment of onychomycosis by maintaining a low pH, inhibiting fungal growth and providing a stable, well-tolerated treatment option.

Implementation Method 1

a physiologically acceptable acid capable of reducing the pH of the skin and/or nails of a treated person to the range of 1.5-4.5

Methodology Applied
Scientific EffectpH reduction:

Data Source

PatentEP3269358B1Composition for topical application, uses thereof, applicator device and kit of parts
Publication Date: 2020.08.05 YOUMEDICAL BV
  • EP3269358B1 patent drawingFigure 1a~1b

AI summary

The invention relates to a composition for topical application, comprising at least one physiologically acceptable acid capable of reducing the pH of the skin of a treated person to the range of 1.5-4.5, and a physiologically acceptable carrier. The invention further relates to various uses for the treatment of skin and nail conditions, including and especially focussing on microbiological infections of the nail (onychomycosis). The invention further relates to an applicator device and kit of parts comprising such a composition.