Topology Optimized Waveguide for 2D TMD Phase Shifter

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Solution Overview

Problem

Integrated photonic phase shifters suffer from high optical losses and high-power requirements, and existing devices using thermo-optic elements or ionically doped semiconductors face issues with carrier injection losses and low refractive index changes, necessitating a more efficient phase shifting mechanism.

Innovation Solution

A photonic device employing a 2D transition metal dichalcogenide monolayer sheet over a topology optimized waveguide on a silicon-on-insulator substrate, where the waveguide is patterned to enhance mode overlap with the 2D TMD, allowing for a π phase shift with reduced length and lower power consumption by applying a controlled DC voltage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a 2D TMD is placed over a conventional waveguide, then phase shift is achieved, but the waveguide length must be many hundreds of microns which increases device size

Engineering Contradiction:
Improvephase shift capabilityVSAvoidwaveguide length
Core Design Contradiction:
ReliabilityVSLength of stationary object

Solution Approach 1:

The waveguide cross-section is locally modified in the region where the 2D TMD is positioned, creating a topology-optimized structure with enhanced mode confinement. This local structural change increases the modal overlap between the waveguide mode and the 2D TMD, thereby enhancing the phase shifting efficiency without requiring a longer waveguide.

Inventive Principle:
Principle #3Local quality

2Ease of manufacture

If conventional waveguide structures are used with 2D TMD, then device fabrication is straightforward, but mode overlap is insufficient requiring long interaction lengths

Engineering Contradiction:
Improvewaveguide fabricationVSAvoidmode overlap efficiency
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The waveguide geometric parameters (width, height, and cross-sectional shape) are optimized in the region underneath the 2D TMD to maximize mode overlap. This topology optimization adjusts the waveguide parameters locally to enhance the electromagnetic field distribution, increasing the interaction efficiency between light and the 2D TMD material.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution achieves a significant reduction in phase shifter length by about an order of magnitude, minimizing optical losses and enabling more compact integration of components, while maintaining efficient phase shifting with low power consumption.

Implementation Method 1

Via the Kerr effect, the 0 to π phase shift required for the phase shifting device is achievable.

Methodology Applied
Scientific EffectKerr effect: Kerr Effect

Implementation Method 2

A change in the refractive index of the TMD is achieved by application of a DC voltage across the TMD.

Methodology Applied
Scientific EffectElectro-optic effect: Electro-Optic Effects

Implementation Method 3

The topology optimized waveguide disperses the optical mode in the region of the 2D TMD. The increased overlap created by the topology optimized structure enhances the interaction between the optical mode and the TMD.

Methodology Applied
Scientific EffectWaveguide mode dispersion: Dispersion (of waves)

Data Source

PatentUS11977281B2Integrated photonic component for enhanced mode overlap of a 2D phase shifter
Publication Date: 2024.05.07 TOYOTA JIDOSHA KK
  • US11977281B2 patent drawing
  • US11977281B2 patent drawing
  • US11977281B2 patent drawing

AI summary

A silicon on insulator (SOI) photonic device having a waveguide is provided that includes a mode overlap portion with a topology optimized structure situated below an electrode of the capacitance structure. The device can significantly change a refractive index in a volume of mode overlap depending upon the applied potential to the capacitor and allows for a π phase shift in a modest mode overlap volume. The topology optimized structure has a waveguide and substrate that are partitioned in three dimensions using an extruded projection design. The electrode is a transition metal di-chalcogenide monolayer sheet (2D TMD). The enhanced mode overlay from the topology optimized waveguide portion allows a large reduction in the length of the waveguide with the mode overlap to achieve the needed phase shift for a photonic device.