Touch Device Light Shielding Pattern Fabrication
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Solution Overview
Problem
Conventional touch devices face high manufacturing costs and reduced process yield due to the need for replacing masks for light shielding pattern changes and damage during edge etching processes after substrate cutting.
Innovation Solution
A two-step process forming light shielding patterns, where a first pattern is created using exposure and development, and a second pattern is formed by printing, allowing for design variations without mask replacement and preventing edge damage during substrate etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the light shielding pattern is formed by exposure and development process, then the pattern can be formed with good precision, but the manufacturing cost increases due to mask replacement when design changes are needed
Solution Approach 1:
The light shielding pattern is divided into two separate formation processes: first pattern (formed by exposure and development) and second pattern (formed by printing). This segmentation allows each process to be optimized independently - the first pattern provides precise alignment features, while the second pattern can be easily modified through printing without mask replacement, thus reducing manufacturing costs for design changes.
Solution Approach 2:
The second light shielding pattern is formed by printing process which creates a copy of the required pattern directly on the substrate. This printing approach eliminates the need for physical masks and their replacement, allowing design changes to be made simply by updating the print data, thereby reducing manufacturing costs while maintaining pattern precision.
2Area of stationary object
If the light shielding pattern aligns with the edges of the glass substrate, then the pattern coverage is maximized, but the pattern is damaged during edge etching process
Solution Approach 1:
The light shielding pattern is segmented into first pattern (formed before cutting) and second pattern (formed after cutting). The first pattern is positioned away from substrate edges to avoid etching damage, while the second pattern is added later to provide edge coverage. This temporal and spatial segmentation allows both edge coverage and pattern protection to be achieved.
Solution Approach 2:
The first light shielding pattern is formed in advance before the substrate cutting and edge etching processes. This preliminary formation allows the pattern to be positioned optimally relative to the main substrate area, away from edges that will be etched. The second pattern is then added after cutting to provide necessary edge coverage without exposing any pattern to etching damage.
3Area of stationary object
If the light shielding pattern is formed close to substrate edges, then the peripheral coverage is improved, but the pattern is vulnerable to damage during cutting and etching processes
Solution Approach 1:
The light shielding function is segmented into two patterns formed at different stages. The first pattern is formed before cutting with intentional spacing from edges to avoid harmful etching effects. The second pattern is formed after cutting to provide peripheral coverage, thus achieving both adequate coverage and protection from etching damage.
Solution Approach 2:
The vulnerable first light shielding pattern is effectively extracted from the edge zone by positioning it inward from substrate edges. The edge coverage function is then taken over by the second light shielding pattern formed after cutting. This extraction removes the pattern from the harmful etching zone while maintaining necessary peripheral coverage.
Data Source
AI summary
A touch device and a fabrication method thereof are provided. The touch device includes a cover lens, a first light shielding pattern and a touch sensing element disposed on the cover lens, a passivation layer covering the touch sensing element and the first light shielding pattern, and a second light shielding pattern disposed on the passivation layer, wherein the second light shielding pattern overlaps with a part of the first light shielding pattern.