Capacitive Touch Panel Electrode Necking for Parasitic Capacitance

The patent applies local quality by varying the width of electrode lines specifically at intersection regions while maintaining standard width in non-intersection regions. The first electrode line has a first width at intersections and a second width (greater than first width) at non-intersection portions, allowing localized optimization to reduce parasitic capacitance without increasing overall panel thickness.

The patent changes the geometric parameter (width) of electrode lines at intersection points to reduce parasitic capacitance. By adjusting the width parameter locally at intersections rather than uniformly across the entire electrode structure, the patent achieves capacitance reduction while maintaining structural integrity and avoiding increased thickness.

The patent implements local quality by applying width modification only at intersection regions where parasitic capacitance occurs, rather than modifying the entire electrode structure. This localized approach reduces material consumption and manufacturing complexity, thereby controlling costs while achieving the desired capacitance reduction.

The patent modifies the width parameter of electrode lines at intersections to optimize electrical performance. This parameter change is applied selectively rather than universally, reducing the overall material requirement and simplifying the manufacturing process compared to uniform electrode design, thus lowering manufacturing costs.

The patent applies local quality by modifying electrode line width specifically at intersection regions while maintaining full width at turning points and non-intersection portions. This localized width reduction targets parasitic capacitance sources without creating weak points at turning points, thereby preventing disconnections while reducing capacitance.

The patent employs curvature principles by ensuring smooth transitions in electrode line geometry at intersections. The rounded or curved design at width transition regions eliminates sharp corners that would concentrate stress, preventing disconnections at turning points while maintaining the reduced width necessary for lowering parasitic capacitance.

The patent applies local quality by reducing electrode line width only at intersection regions where parasitic capacitance is generated, while maintaining the standard greater width at non-intersection portions and turning points. This selective width modification preserves the sensing area and electrode effectiveness for touch detection, maintaining sensing sensitivity while reducing parasitic capacitance at problematic intersection points.

The patent changes the width parameter of electrode lines in a spatially varying manner - narrower at intersections to reduce capacitance, wider at non-intersection portions to maintain sensing sensitivity. This differential parameter application optimizes both electrical performance and sensing capability by matching electrode geometry to functional requirements at different locations.