Capacitive Touch Screen Routing via Half-Tone Photomask
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Solution Overview
Problem
The existing manufacturing process for capacitive touch screen panels requires multiple photomask processes, leading to increased time and costs due to the complexity of photolithography processes.
Innovation Solution
A capacitive touch screen panel design featuring a double layer structure for routing wires and a single layer structure for connection patterns, formed using a half-tone photomask process, which reduces the number of photomask processes required.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple photomask processes are used to form routing wires and connection patterns separately, then the manufacturing precision and quality are improved, but the manufacturing time and cost increase
Solution Approach 1:
The patent combines the formation of routing wires and connection patterns into a single photomask process. The half-tone photomask technique allows both structures to be formed simultaneously in one exposure step, eliminating the need for separate photomask processes while maintaining the required manufacturing precision.
Solution Approach 2:
The patent utilizes half-tone photomask technology which changes the optical parameters during exposure. By controlling the exposure dose and developing conditions, the same photomask can create different structure types (routing wires and connection patterns) with appropriate line widths and depths, achieving differentiated structures through parameter control rather than multiple processes.
2Manufacturing precision
If multiple photomask processes are used to form routing wires and connection patterns separately, then the manufacturing precision and quality are improved, but the manufacturing cost increases
Solution Approach 1:
The patent combines the formation of routing wires and connection patterns into a single photomask process. The half-tone photomask technique allows both structures to be formed simultaneously in one exposure step, eliminating the need for separate photomask processes while maintaining the required manufacturing precision.
Solution Approach 2:
The patent utilizes half-tone photomask technology which changes the optical parameters during exposure. By controlling the exposure dose and developing conditions, the same photomask can create different structure types (routing wires and connection patterns) with appropriate line widths and depths, achieving differentiated structures through parameter control rather than multiple processes.
3Loss of time
If a single photomask process is used to form routing wires and connection patterns, then the manufacturing time and cost are reduced, but the contact resistance may increase
Solution Approach 1:
The patent utilizes half-tone photomask technology which changes the optical parameters during exposure. By controlling the exposure dose and developing conditions, the same photomask can create different structure types (routing wires and connection patterns) with appropriate line widths and depths, achieving differentiated structures through parameter control rather than multiple processes.
Solution Approach 2:
The patent applies different structural characteristics to different regions formed in the same photomask process. Connection patterns are formed with sufficient line width and depth to ensure low contact resistance, while routing wires can be optimized for other parameters. Each structure type achieves its local quality requirements through controlled exposure parameters.
Data Source
AI summary
A capacitive touch screen panel includes a substrate, a plurality of first electrode serials arranged in parallel in a first direction, a plurality of second electrode serials arranged in parallel intersecting the first electrode serials, a plurality of first routing wires, a plurality of second routing wires and an insulation layer that electrically insulates the first electrode serials from the second electrode serials, wherein each of the first electrode serials includes a plurality of first electrode patterns and a plurality of first connection patterns, and wherein a first conductive layer of the first routing wire, a first conductive layer of the second routing wire, and the first connection patterns are formed in the same layer.


