Touch Screen Panel Mesh Pattern Overlap Reduction

The patent extracts the problematic overlapping capacitance by selectively removing portions of the mesh patterns in the overlapping region. Specifically, certain conductive lines are disconnected at crossing points where first and second mesh patterns would otherwise overlap, thereby eliminating the source of overlapping capacitance while preserving the overall electrode structure and sensing area.

The patent applies local quality by creating non-uniform mesh pattern structures - in regions where electrodes overlap, the mesh pattern is modified with disconnected conductive lines to reduce capacitance, while in non-overlapping regions the complete mesh pattern is maintained to ensure full sensing coverage. This localized modification optimizes both sensitivity and accuracy in different spatial zones.

The patent segments the mesh pattern into distinct regions - complete mesh patterns in non-overlapping areas and modified mesh patterns with disconnected lines in overlapping areas. This segmentation allows the electrode structure to adapt its complexity locally, maintaining simple continuous patterns where needed and introducing complexity only where necessary to reduce overlapping capacitance.

The patent applies partial action by selectively modifying only the portions of mesh patterns that occur in overlapping regions, rather than redesigning the entire electrode structure. The modification is applied partially - only at specific crossing points where overlap occurs - thereby achieving the necessary capacitance reduction without unnecessarily complicating the overall electrode design.