Shadow Elimination in Capacitive Touch Screens
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current capacitance type touch screens face issues with apparent etching textures due to large differences in reflectivity between patterned and non-patterned regions of the ITO layer, leading to degraded visual effects and increased production time for shadow elimination.
Innovation Solution
A shadow elimination arrangement comprising a silicon oxynitride layer with refractivity in the range of 1.47-2.0, deposited below the ITO layer, and a silicon dioxide layer above it, to equalize reflectivity between patterned and non-patterned regions, along with additional protection for the ITO layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a single layer or multiple layers of structure consisted of Nb2O5 film and SiO2 film is deposited between substrate and electrode to eliminate shadow, then shadow elimination effect can be observed, but production time is significantly extended and defects cannot be detected timely
Solution Approach 1:
The shadow elimination layer is deposited before the ITO electrode layer, allowing the shadow elimination effect to be established in advance. This preliminary action enables defect detection after ITO etching without requiring additional production time, as the shadow elimination structure is already in place to modify light reflection characteristics.
Solution Approach 2:
The shadow elimination layer acts as an intermediary between the substrate and the ITO electrode layer. It mediates the optical interaction by controlling light reflection and refraction, thereby eliminating shadows caused by ITO pattern etching while maintaining production efficiency.
2Ease of operation
If ITO layer is etched to form patterned region and non-patterned region, then touch sensor functionality is achieved, but large difference in reflectivity between regions causes apparent etching texture and degraded visual effect
Solution Approach 1:
The shadow elimination layer has different optical properties in different regions corresponding to the patterned and non-patterned ITO areas. By controlling the thickness and material composition locally, it compensates for the reflectivity difference between etched and non-etched regions, making the etching texture invisible while preserving touch sensor functionality.
Solution Approach 2:
The shadow elimination layer modifies optical parameters (reflectivity, refractivity) to compensate for the reflectivity difference caused by ITO etching. By adjusting the thickness and material composition of this layer, the overall optical appearance is uniformized, eliminating the visual impact of etching textures.
3Object-affected harmful factors
If Nb2O5 film and SiO2 film structure is deposited to eliminate shadow, then shadow reduction is achieved, but transmittivity of touch screen is not improved
Solution Approach 1:
The shadow elimination layer uses a composite structure combining SiO2 and Nb2O5 materials with specific thickness ratios. This composite material approach optimizes both shadow elimination and light transmittivity by leveraging the complementary optical properties of different materials - SiO2 for low refractive index and Nb2O5 for high refractive index, creating an anti-reflective effect that improves transmittivity while eliminating shadows.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively eliminates the appearance of etching textures and allows for timely detection of defects, improving the visual quality and transmittivity of the touch screen.
Implementation Method 1
a silicon oxynitride layer, on which the pattern of ITO layer is provided, being provided on a transparent substrate
Implementation Method 2
a silicon dioxide layer, provided over the pattern of the ITO layer
Data Source
AI summary
Embodiments of the present application provide a shadow elimination arrangement, a touch screen and a method for producing the same. The shadow elimination arrangement for a pattern of an ITO layer includes a silicon oxynitride layer, on which the pattern of the ITO layer is provided, being provided on a transparent substrate; and a silicon dioxide layer, provided over the pattern of the ITO layer.


