Large-Scale Touch Sensing Pattern Assembly via Divisional Exposure
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Solution Overview
Problem
Current methods for manufacturing large-scale touch sensing patterns face challenges due to the limitations of existing photo process machines, which are expensive and result in errors during the assembly of divisional patterns due to poor recognition rates of the CCD observer caused by the low reflectivity of solidified photoresist material to blue light.
Innovation Solution
The method involves dividing the large-scale touch sensing pattern into multiple divisional patterns with overlapping portions, using UV-sensitive photoresist layers with a color changing agent, and employing a light source with a wavelength of 620 nm to 750 nm for improved positioning, allowing for accurate assembly and etching of the complete pattern using smaller exposure machines.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a large-scale photo process machine is purchased to manufacture large-size touch sensing patterns, then the manufacturing capability is improved, but the production cost increases significantly
Solution Approach 1:
The patent divides the large-scale touch sensing pattern into multiple divisional patterns that can be manufactured separately by smaller photo process machines. Each divisional pattern is exposed and developed independently, then assembled together to form the complete large-scale pattern. This segmentation approach avoids the need to purchase expensive large-scale photo process machines while still achieving the capability to manufacture large-size touch sensing patterns.
2Ease of manufacture
If multiple divisional patterns are assembled to form a complete touch sensing pattern, then the use of smaller machines is enabled, but positioning errors occur due to poor recognition of the CCD observer
Solution Approach 1:
The patent introduces a color changing agent into the photoresist layer that causes the photoresist to change color when exposed to UV light. This color change creates a strong optical contrast that the CCD observer can easily detect and recognize. The color changing agent ensures that the positioning targets and pattern features remain highly visible to the blue light source of the CCD observer throughout the multi-step exposure process, thereby maintaining high positioning accuracy when assembling multiple divisional patterns.
Solution Approach 2:
The color changing agent acts as an intermediary that enhances the interaction between the UV exposure and the CCD observation system. By converting the UV exposure effect into a visible color change, it mediates between the photoresist material and the CCD observer's blue light detection, ensuring reliable recognition and positioning.
3Manufacturing precision
If solidified photoresist material is used in the exposure process, then the pattern formation is achieved, but the reflectivity to blue light decreases causing poor recognition by the CCD observer
Solution Approach 1:
The patent addresses the low reflectivity issue by incorporating a color changing agent that causes the photoresist to change color upon UV exposure. This color change creates a strong optical contrast that compensates for the reduced reflectivity of solidified photoresist to blue light. The color changing agent ensures that even though the photoresist solidifies and its reflectivity decreases, the exposed and unexposed regions remain clearly distinguishable to the CCD observer, maintaining high recognition rates for positioning and pattern verification.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the production of large-scale touch sensing patterns with reduced production costs and improved accuracy by utilizing smaller exposure machines and enhancing the recognition of positioning targets, resulting in precise assembly and etching of the complete pattern.
Implementation Method 1
exposing the photoresist layer with a photomask having a capacitive sensing strings pattern to make the photoresist material solidify due to polymerization resulting from irradiation of UV light
Implementation Method 2
The photoresist layer comprises a color changing agent for promoting the photoresist layer to change from colorless to colored when the photoresist layer is irradiated by UV rays
Data Source
AI summary
The method includes the steps of: a) dividing a large-scale touch sensing pattern to be manufactured into multiple divisional patterns and producing multiple photomasks corresponding to the multiple divisional patterns; b) providing a substrate with a conductive layer; c) disposing a photoresist layer on the conductive layer; d) a first exposure process: forming an exposing divisional pattern and multiple first targets the photoresist layer; e) an adjacent exposure process: forming an adjacent exposing divisional pattern and multiple second targets, and adjacently connecting the adjacent exposing divisional pattern and the exposing divisional pattern originally on the photoresist layer; f) repeating the adjacent exposure process to form multiple adjacent exposing divisional patterns until a complete exposing pattern has been assembled; g) performing a developing process to the photoresist layer; and h) etching the conductive layer to form the large-scale touch sensing pattern on the conductive layer.