Touch Sensor Insulating Layer Edges for Faster, Cooler Etching
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Solution Overview
Problem
The large film thickness of the insulating layer at the opening of a touch sensor leads to prolonged etching times, which increases the temperature of the display panel, degrading the performance of light-emitting elements such as OLEDs and QLEDs.
Innovation Solution
A touch sensor design with thinner edges in the insulating layers and a manufacturing method involving dry-etching techniques to form thin film portions in these layers, reducing the film thickness at the opening.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the film thickness of the insulating layer at the opening position is large, then the structural integrity and insulation performance are improved, but the etching time increases and the temperature of the display panel increases
Solution Approach 1:
The patent applies local quality by creating a thickness gradient in the insulating layer - the edge portion has smaller film thickness while the center portion maintains larger film thickness. This allows the opening area to be etched faster (reducing temperature rise) while other areas maintain sufficient insulation performance.
Solution Approach 2:
The insulating layer is segmented into different thickness regions - a thin-edge portion at the opening and a thick-center portion elsewhere. This segmentation enables selective etching behavior where the thin edge etches quickly while the thick center provides structural support and insulation.
2Strength
If the film thickness of the insulating layer at the opening position is large, then the structural integrity is improved, but the etching time increases
Solution Approach 1:
The insulating layer has non-uniform thickness with the edge portion being thinner than the center portion. This local quality variation allows the opening area to be etched rapidly (reducing etching time) while the thicker center portion maintains structural integrity.
Solution Approach 2:
The insulating layer is divided into a thin-edge portion and a thick-center portion. The thin edge enables fast etching while the thick center provides structural support, effectively segmenting the layer to address both time and strength requirements.
3Loss of time
If the film thickness of the insulating layer at the opening position is reduced, then the etching time is shortened and temperature rise is reduced, but the insulation performance may be compromised
Solution Approach 1:
The insulating layer implements local quality by having the edge portion (at the opening) with smaller film thickness for fast etching, while the center portion maintains larger film thickness for good insulation performance. Each region has optimized thickness for its specific function.
Solution Approach 2:
The insulating layer is segmented into functional zones: a thin-edge portion optimized for rapid etching and a thick-center portion optimized for insulation. This segmentation allows both requirements to be satisfied simultaneously in different locations.
4Loss of time
If the film thickness of the insulating layer is reduced uniformly, then the etching time is shortened, but the structural integrity and insulation performance deteriorate
Solution Approach 1:
Rather than uniform thinning, the patent applies local quality by creating a thickness gradient where only the edge portion is thin while the center remains thick. This localized variation enables fast etching at the opening while preserving structural integrity through the thicker center portion.
Solution Approach 2:
The insulating layer is segmented into a thin-edge portion for fast etching and a thick-center portion for structural support. This non-uniform segmentation avoids the pitfalls of uniform thinning while achieving the desired etching speed improvement.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Reduces the temperature rise and variation in etching depth, preventing electrical short circuits and maintaining the performance of the display panel.
Implementation Method 1
forming a first thin film portion in the first insulating layer by dry-etching the first insulating layer in a state where the first wiring line is covered with a first resist, and forming a second thin film portion in the second insulating layer by dry-etching the second insulating layer in a state where the second wiring line is covered with a second resist
Data Source
AI summary
A touch sensor includes a first insulating layer, a first wiring line located above the first insulating layer, and a second insulating layer located above the first wiring line. An opening extending through the first insulating layer and the second insulating layer is formed. The first insulating layer includes a first edge corresponding to an edge of the opening. The second insulating layer includes a second edge corresponding to an edge of the opening. A film thickness of the first edge is thinner than a film thickness of a portion other than the first edge in the first insulating layer, or a film thickness of the second edge is thinner than a film thickness of a portion other than the second edge in the second insulating layer.