Tournament Nozzle Structure for Uniform Vertical Gas Distribution
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Solution Overview
Problem
Existing gas dispersion nozzles in film forming apparatuses suffer from non-uniform distribution of reactive species along their vertical length, leading to variations in gas flow rate and decomposition degree, which affects the uniformity of film deposition on substrates.
Innovation Solution
The tournament nozzle structure, which includes an introduction section, ejection sections with multiple gas holes, and a branch section, ensures that the raw material gas is evenly distributed across multiple ejection chambers, maintaining uniform mass flow rate and decomposition degree along the nozzle's length by branching the gas in a tournament manner.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a conventional gas dispersion nozzle is used to supply gas along the vertical direction, then the gas can be supplied to multiple substrates, but the distribution of reactive species becomes non-uniform along the vertical length, leading to variations in film thickness
Solution Approach 1:
The gas supply system is segmented into multiple independent ejection chambers (first, second, third ejection chambers) with separate gas holes at different vertical positions. Each chamber can control gas flow independently to specific height ranges, allowing precise regulation of reactive species distribution along the vertical direction to achieve uniform film deposition across substrates at different heights
Solution Approach 2:
Different ejection chambers are designed with different gas hole configurations tailored to specific vertical regions. The first ejection chamber supplies gas to lower substrates, the second to middle substrates, and the third to upper substrates. This local optimization ensures that each region receives appropriate gas flow and reactive species concentration for uniform film formation
2Device complexity
If gas is supplied through a single vertical nozzle, then the structure is simple, but the decomposition degree of gas varies along the length, affecting uniformity
Solution Approach 1:
The single vertical nozzle is divided into multiple ejection chambers with distinct gas holes positioned at different heights. This segmentation allows independent control of gas decomposition and flow characteristics in different vertical zones, ensuring uniform decomposition degree and reactive species generation throughout the processing chamber without requiring an overly complex single-structure design
3Area of stationary object
If gas holes are distributed along the entire vertical length, then gas can reach all substrates, but the mass flow rate varies significantly, causing non-uniform reactive species concentration
Solution Approach 1:
The gas distribution system is divided into separate ejection chambers, each with gas holes positioned at specific vertical intervals. This segmentation enables independent optimization of gas flow parameters for each chamber, maintaining uniform mass flow rate and reactive species concentration across the entire vertical coverage area while avoiding the flow variations that would occur with a single continuous distribution system
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in improved uniformity of film thickness across multiple substrates by maintaining consistent mass flow rate and decomposition degree, reducing variations in reactive species concentration and enhancing the interplanar uniformity of deposited films.
Implementation Method 1
a plurality of gas holes 122a to 122h through which a gas is ejected into the processing container 10
Implementation Method 2
ensures that the raw material gas is evenly distributed across multiple ejection chambers, maintaining uniform mass flow rate and decomposition degree along the nozzle's length by branching the gas in a tournament manner
Implementation Method 3
maintaining uniform mass flow rate and decomposition degree along the nozzle's length by branching the gas in a tournament manner
Implementation Method 4
improved uniformity of film thickness across multiple substrates by maintaining consistent mass flow rate and decomposition degree, reducing variations in reactive species concentration and enhancing the interplanar uniformity of deposited films
Data Source
AI summary
A gas introduction structure extends in a longitudinal direction of a processing container having a substantially cylindrical shape to supply gas into the processing container. The gas introduction structure includes an introduction section that partitions an introduction chamber, an ejection section that partitions a plurality of ejection chambers each including a plurality of gas holes through which the gas is ejected into the processing container, and a branch section that partitions a branch chamber connected to the introduction chamber. The branch chamber is branched to correspond to the number of ejection chambers in a tournament manner and connected to the ejection chambers.