Transfer Arm Motion Control for Semiconductor Wafer Handling
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Solution Overview
Problem
In semiconductor processing systems, the transfer of wafers between process chambers results in composite accelerations that can exceed permissible limits when both swing and slide motions are performed simultaneously, leading to reduced throughput and accuracy due to increased wafer handling operations and potential shock or vibration.
Innovation Solution
A transfer apparatus with a control system that stores pattern model data for composite motion patterns and time-based motion tracks, preventing composite acceleration from exceeding permissible limits by optimizing the operation of the base and extendable/retractable transfer arm to perform slide and swing motions in a coordinated manner.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the transfer arm performs swing motion at high speed to improve transfer efficiency, then productivity increases, but composite acceleration exceeds permissible limits causing wafer handling instability
Solution Approach 1:
The system dynamically adjusts motion parameters by coordinating swing and slide motions based on real-time acceleration calculations. The control apparatus modifies the swing motion profile when slide motion is simultaneously applied, ensuring composite acceleration remains within permissible limits while maintaining high transfer speed
Solution Approach 2:
The control apparatus changes motion parameters by calculating composite acceleration from swing and slide motions, then adjusting the swing motion parameters dynamically. This allows the system to operate at high speeds while preventing acceleration exceedance through real-time parameter optimization
2Productivity
If the number of process chambers is increased to improve throughput, then productivity increases, but the number of wafer handling operations increases leading to more complex transfer control
Solution Approach 1:
The control apparatus provides universal control functionality that automatically adapts to any number of process chambers. The system handles multiple chambers through a unified control framework that manages swing and slide motions regardless of the specific number or arrangement of chambers, reducing operational complexity
Solution Approach 2:
The system employs feedback mechanisms where the control apparatus continuously monitors transfer operations and adjusts motion control based on chamber configuration and operational status. This feedback loop simplifies complex multi-chamber coordination by automatically optimizing transfer paths and timing
3Loss of time
If slide motion and swing motion are performed simultaneously to reduce transfer time, then productivity increases, but composite acceleration exceeds permissible limits causing vibration and shock
Solution Approach 1:
The control apparatus dynamically changes motion parameters by calculating the composite acceleration resulting from simultaneous slide and swing motions. When acceleration approaches permissible limits, the system adjusts motion profiles to eliminate vibration and shock while maintaining efficient transfer timing
Solution Approach 2:
The system maintains continuous transfer action by coordinating slide and swing motions to overlap in time rather than executing them sequentially. This continuous action reduces total transfer time while the control apparatus ensures harmful vibrations and shocks are prevented through acceleration management
Data Source
AI summary
A processing system includes a transfer chamber, a plurality of chambers connected to the transfer chamber, a transfer apparatus disposed in the transfer chamber, and a control section configured to control the transfer apparatus. The transfer apparatus includes a base and transfer arm configured to perform a slide motion and a swing motion, respectively. The control section includes a storage portion and an operational controller. The storage portion stores pattern model data concerning a plurality of motion patterns each indicative of a composite motion of the slide motion and the swing motion, and track model data concerning time-based motion tracks respectively corresponding to the motion patterns. The operational controller is configured to retrieve necessary data from the pattern model data and the track model data and control the transfer apparatus in accordance therewith.