Transfer Chamber Filter Replacement Without Atmosphere Exposure
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Solution Overview
Problem
Existing transfer chambers face challenges in replacing gas processing devices without disrupting the internal atmosphere, leading to increased stop times and gas consumption during filter replacement, which can introduce particles and compromise cleanliness.
Innovation Solution
A transfer chamber design with a circulation path and connecting/disconnecting means for the gas processing device, allowing for replacement without exposing the internal atmosphere to external air, using a gas processing box that can be connected or disconnected from the main chamber, and a gas purge system to maintain cleanliness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of repair
If the chemical filter is replaced by opening the entire transfer chamber, then the chemical filter can be accessed for replacement, but the internal atmosphere is exposed to external air causing particles to enter and requiring stop time for the transfer process
Solution Approach 1:
The transfer chamber is divided into a main chamber and a filter replacement chamber separated by a partition wall. The chemical filter is located in the filter replacement chamber, allowing it to be accessed and replaced independently without opening the main chamber. This segmentation enables maintenance work on the filter while keeping the main transfer chamber sealed and operational.
Solution Approach 2:
The chemical filter is extracted from the main transfer chamber environment and placed in a separate filter replacement chamber. This extraction allows the filter to be replaced in isolation, preventing contamination of the main chamber atmosphere during filter maintenance while still enabling easy access for filter replacement.
2Ease of repair
If the entire transfer chamber is opened for chemical filter replacement, then the filter can be replaced, but the stop time of the transfer process increases and gas consumption increases
Solution Approach 1:
The transfer chamber is segmented into operational and maintenance zones. The filter replacement chamber can be accessed independently, allowing filter replacement to proceed while the main chamber continues its transfer operations. This reduces or eliminates stop time for the transfer process during filter maintenance.
Solution Approach 2:
The filter replacement chamber is pre-configured with access ports and structural features that allow filter replacement to be performed quickly and efficiently. The partition wall includes openings that facilitate filter removal and installation without requiring complete chamber disassembly, enabling rapid maintenance operations.
3Object-affected harmful factors
If the chemical filter is replaced with frequent gas atmosphere replacement, then the internal atmosphere can be maintained clean, but gas consumption increases causing cost increase
Solution Approach 1:
The chemical filter is extracted into a separate chamber, allowing it to be replaced without disrupting the sealed atmosphere of the main transfer chamber. This eliminates the need for frequent gas replacement that would occur with traditional filter access methods, significantly reducing gas consumption while maintaining atmospheric purity.
Solution Approach 2:
The sealed atmosphere in the main transfer chamber can be maintained continuously without interruption during filter replacement operations. The filter is replaced in the separate chamber while the main chamber atmosphere continues to circulate and maintain its clean state, eliminating repeated gas purging and replacement cycles.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient replacement of gas processing devices without affecting the internal atmosphere, reducing stop times and gas consumption, while maintaining a clean environment for transferring objects.
Implementation Method 1
a circulation path formed inside of the transfer chamber to circulate gas
Implementation Method 2
it is possible to efficiently remove chemical components by using a chemical filter as a gas processing device
Data Source
AI summary
To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).