Transfer Chamber Gas Filter Replacement Without Atmosphere Exposure
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Solution Overview
Problem
The existing transfer chambers face challenges in efficiently removing chemical components without disrupting the internal atmosphere, leading to increased stop times and gas consumption during filter replacements, and potential contamination risks when replacing gas processing devices.
Innovation Solution
A transfer chamber design that allows for the replacement of gas processing devices without affecting the internal atmosphere, using a connecting and disconnecting mechanism to form a shortened circulation path, and includes a gas purge system to maintain cleanliness and humidity control, enabling continuous operation and reduced downtime.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of repair
If the chemical filter is replaced by opening the entire transfer chamber, then the chemical filter can be replaced, but the transfer process must be stopped and the internal atmosphere is exposed to external air causing contamination
Solution Approach 1:
The transfer chamber is divided into two independent spaces: the internal space for transferring objects and the external space for housing the gas processing device. This segmentation allows the gas processing device to be replaced in the external space without opening the internal space, thus maintaining the cleanliness of the internal atmosphere while enabling filter replacement.
2Ease of repair
If the entire transfer chamber is opened for gas processing device replacement, then the device can be replaced, but stop time of transfer process increases
Solution Approach 1:
By segmenting the transfer chamber into internal and external spaces with separate access points, the gas processing device can be replaced in the external space without interrupting the transfer process in the internal space, thus reducing stop time to nearly zero.
3Ease of repair
If the entire transfer chamber is opened for gas processing device replacement, then the device can be replaced, but gas consumption increases
Solution Approach 1:
The segmentation of the transfer chamber allows replacement of the gas processing device in the external space without exposing the internal space to external air, thereby eliminating the need to purge and refill large amounts of protective gas, thus reducing gas consumption.
Solution Approach 2:
The gas processing device is extracted to the external space, separating it from the internal atmosphere. This allows maintenance operations on the gas processing device without affecting the internal atmosphere, eliminating the need for gas consumption during replacement operations.
4Reliability
If the chemical filter is replaced, then fresh filter can remove chemical components, but particles and contaminants may enter during replacement
Solution Approach 1:
The transfer chamber is segmented into internal and external spaces, allowing the chemical filter to be replaced in the external space without exposing the internal space to external air. This prevents particles and contaminants from entering the internal space during filter replacement, maintaining the clean atmosphere while ensuring the filter remains effective.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient replacement of gas processing devices without exposing the internal atmosphere to external air, reducing stop times and gas consumption, while maintaining a clean and stable environment for transferring objects.
Implementation Method 1
it is possible to provide a chemical filter to efficiently remove chemical components from the circulating N2 gas
Implementation Method 2
since it is necessary to keep the inside clean while reducing the supply amount of fresh N2 gas, it is possible to make N2 gas circulate while passing through a filter
Data Source
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AI summary
To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).