Transfer Chamber Humidity Control for Chemical Filter Hydrolysis
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Solution Overview
Problem
The existing transfer chambers face challenges in maintaining a clean environment due to insufficient removal of chemical components, particularly when the humidity is low, as the N2 gas used does not contain moisture, hindering the chemical filter's hydrolysis reaction efficiency in removing acid and alkali components.
Innovation Solution
A transfer chamber with a humidity management system that includes a moisture supply means, comprising a flow control unit, a sprayer, and a vaporizer to maintain internal humidity, ensuring the chemical filter can effectively perform hydrolysis reactions, and a heat keeping means to prevent condensation and excessive moisture entry.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If N2 gas is supplied into the transfer chamber to maintain a clean atmosphere, then chemical components can be removed by circulation through a chemical filter, but the chemical filter cannot efficiently remove acid and alkali components due to low humidity
Solution Approach 1:
The patent changes the humidity parameter of the N2 gas from low (near zero) to a controlled range (30-70% RH) to enable the chemical filter's hydrolysis reaction mechanism to function effectively. This is achieved by introducing moisture through a moisture supply unit while maintaining overall N2 atmosphere, thereby restoring the chemical filter's ability to remove acid and alkali components.
Solution Approach 2:
The patent introduces moisture as an intermediary substance that facilitates the chemical filter's removal mechanism. The moisture acts as a mediator between the N2 gas atmosphere and the chemical filter, enabling the hydrolysis reaction without compromising the overall inert N2 environment. The moisture supply unit and humidity control system serve as intermediary devices to achieve this balance.
2Reliability
If humidity is increased to enable chemical filter function, then acid and alkali components can be removed, but excessive moisture may enter the transfer chamber or condense in pipes
Solution Approach 1:
The patent implements a feedback control system using a humidity sensor to monitor the humidity level in real-time and adjust the moisture supply accordingly. The control unit receives humidity sensor signals and dynamically controls the moisture supply unit to maintain humidity within the target range (30-70% RH), preventing both insufficient humidity (which would impair chemical filter function) and excessive humidity (which would cause condensation or moisture entry).
Solution Approach 2:
The patent makes the humidity control system dynamic by continuously adjusting the moisture supply based on real-time conditions. The system transitions from a static N2 atmosphere to a dynamically controlled humidified N2 atmosphere, where humidity levels are actively managed to optimize chemical filter performance while preventing harmful effects of excessive moisture.
3Loss of energy
If N2 gas circulation is implemented to reduce consumption, then running costs are reduced, but chemical components carried by wafers cannot be exhausted to the outside
Solution Approach 1:
The patent converts the previously harmful circulating N2 gas that carried chemical components into a beneficial system by introducing humidity control. The same N2 circulation that previously prevented chemical component removal now becomes effective because the introduced moisture enables the chemical filter's hydrolysis reaction, transforming the circulating gas from a problem source into a solution vehicle.
Solution Approach 2:
The patent changes the chemical composition parameter of the N2 gas by adding controlled moisture content. This parameter change transforms the N2 gas from an inert, dry atmosphere that cannot remove chemical components to a humidified atmosphere that enables chemical filtration while maintaining N2 circulation for cost efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for efficient removal of chemical components, maintaining a clean environment within the transfer chamber, enabling the transfer of objects in a pristine state while reducing N2 gas consumption and operational costs.
Implementation Method 1
Since the chemical filter has a removal mechanism using a hydrolysis reaction regarding acid components and alkali components
Implementation Method 2
a vaporizer configured to evaporate the water sprayed into the gas
Implementation Method 3
a heat keeping means configured to keep a pipe warm is provided in the gas supply line
Data Source
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AI summary
To provide a transfer chamber capable of maintaining a removing function of chemical components with a chemical filter by properly keeping internal humidity, and transferring a transferred object in a clean state. The transfer chamber transfers a wafer (W) as a transferred object to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) as a chemical filter provided in the midstream of the circulation path (CL), a humidity detector (HG2) as a humidity detection means which detects internal humidity, a gas supply means (NS) which supplies gas to the inside of the transfer chamber (1), and a moisture supply means (HS) which supplies moisture content to the inside of the transfer chamber (1). The moisture supply means (HS) is made to operate in accordance with a humidity detection value by the humidity detection means.