Transfer chamber

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Solution Overview

Problem

Existing transfer chambers face challenges in replacing gas processing devices without affecting the internal atmosphere, leading to increased stop time and gas consumption, as well as potential contamination during filter replacement.

Innovation Solution

A transfer chamber design with a circulation path and a connecting/disconnecting mechanism for the gas processing device, allowing for replacement without exposing the internal atmosphere to external air, and a gas purge system to maintain cleanliness and efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of repair

If the chemical filter is replaced by opening the entire transfer chamber, then the chemical filter can be replaced, but the transfer process must be stopped and the internal atmosphere is contaminated

Engineering Contradiction:
Improvechemical filter replacementVSAvoidtransfer process continuity
Core Design Contradiction:
Ease of repairVSProductivity

Solution Approach 1:

The transfer chamber is divided into a chamber body and a separately replaceable gas processing device module. The gas processing device can be disconnected and replaced without opening the entire transfer chamber, allowing maintenance without stopping the transfer process and preventing contamination of the internal atmosphere.

Inventive Principle:
Principle #1Segmentation

2Ease of repair

If the chemical filter is replaced by opening the entire transfer chamber, then the chemical filter can be replaced, but gas consumption increases and replacement time is extended

Engineering Contradiction:
Improvechemical filter replacementVSAvoidreplacement time
Core Design Contradiction:
Ease of repairVSLoss of time

Solution Approach 1:

The gas processing device is designed as a modular, separately replaceable component. This segmentation allows the filter to be replaced quickly by simply disconnecting the module without the time-consuming process of opening the entire chamber and purging the internal atmosphere.

Inventive Principle:
Principle #1Segmentation

3Ease of repair

If the chemical filter is replaced by opening the entire transfer chamber, then the chemical filter can be replaced, but the internal atmosphere is exposed to external air causing contamination

Engineering Contradiction:
Improvechemical filter replacementVSAvoidinternal atmosphere contamination
Core Design Contradiction:
Ease of repairVSObject-affected harmful factors

Solution Approach 1:

The transfer chamber is segmented into a sealed chamber body and a replaceable gas processing device module. This allows the filter to be replaced without opening the chamber body, thus preventing particles and external air from contaminating the clean internal atmosphere.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

A disconnecting mechanism serves as an intermediary between the chamber body and the gas processing device. This mechanism enables the gas processing device to be removed and replaced without direct exposure of the chamber interior to external air, maintaining atmosphere purity during maintenance.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the replacement of gas processing devices without stopping the transfer process, reducing gas consumption and maintaining a clean internal atmosphere, thus shortening or eliminating stop times associated with filter replacement.

Implementation Method 1

a circulation path formed inside of the transfer chamber to circulate gas

Methodology Applied
Scientific EffectGas circulation: Convection

Implementation Method 2

it is possible to provide a chemical filter to efficiently remove chemical components from the circulating N2 gas

Methodology Applied
Scientific EffectChemical filtration: Adsorption

Data Source

PatentUS11424145B2Transfer chamber
Publication Date: 2022.08.23 SINFONIA TECHNOLOGY CO LTD
  • US11424145B2 patent drawing
  • US11424145B2 patent drawing
  • US11424145B2 patent drawing

AI summary

To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter.The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).