Transfer Chamber Pressure Control for Lower Inert Gas Use
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Solution Overview
Problem
The consumption of inert gas is high in substrate processing apparatuses due to continuous supply and exhaust processes, especially in transfer chambers with larger volumes compared to process chambers, leading to inefficiencies and potential contamination.
Innovation Solution
A method of controlling the atmosphere by adjusting the inert gas supply and exhaust in transfer chambers relative to process chambers, ensuring the transfer chamber maintains a higher pressure than the process chamber during specific steps, thereby reducing gas consumption and preventing contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If inert gas is continuously supplied into the transfer chamber to maintain positive pressure, then contamination is prevented, but gas consumption increases
Solution Approach 1:
The patent implements periodic action by controlling the inert gas supply to the transfer chamber based on the operational state of the process chamber. Gas is supplied at higher amounts during substrate transfer operations and reduced or stopped during processing operations, transforming the continuous supply into a periodic, demand-based supply pattern that maintains contamination prevention while reducing overall gas consumption
Solution Approach 2:
The patent applies parameter changes by dynamically adjusting the flow rate and pressure parameters of inert gas supply to the transfer chamber. The control system modifies these parameters according to the pressure differential between chambers and the operational phase, optimizing the balance between maintaining positive pressure for contamination prevention and minimizing gas consumption
2Ease of operation
If the transfer chamber volume is larger than the process chamber, then substrate transfer is facilitated, but gas consumption increases due to larger volume requiring more gas for pressure maintenance
Solution Approach 1:
The patent implements dynamics by making the inert gas supply system adaptive and responsive to real-time conditions. The gas flow rate is dynamically adjusted based on the operational phase (transfer vs. processing), the pressure differential between chambers, and the volume requirements, transforming a static continuous supply system into a dynamic, optimized supply system that accounts for the large transfer chamber volume only when necessary
3Reliability
If inert gas is supplied at high flow rate, then positive pressure is maintained more effectively, but gas consumption increases
Solution Approach 1:
The patent applies parameter changes by implementing variable flow rate control of inert gas supply to the transfer chamber. The system adjusts the gas flow parameter dynamically based on the operational requirements - using higher flow rates only when needed for substrate transfer and maintaining lower or zero flow rates during process chamber operations, thereby maintaining effective positive pressure while significantly reducing overall gas consumption
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces inert gas consumption and minimizes contamination by maintaining a pressure differential, ensuring efficient and controlled gas management within the substrate processing apparatus.
Implementation Method 1
an amount of an inert gas supplied into the first vessel in a state where an inner pressure of the first vessel is higher than that of the second vessel is adjusted
Data Source
AI summary
It is possible to reduce a consumption amount of an inert gas. There is provided a technique that includes: (a) moving a substrate between a first vessel and a second vessel wherein a substrate is processed in the second vessel and the first vessel is capable of communicating with the second vessel; (b) processing the substrate in the second vessel; and (c) waiting without processing the substrate in the second vessel, wherein an amount of an inert gas supplied into the first vessel in a state where an inner pressure of the first vessel is higher than that of the second vessel is adjusted such that the amount in (a) is greater than one or both of the amount in (b) and the amount in (c).