Transfer Chamber Vacuum Threshold Matching for Faster E-Beam Throughput
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Solution Overview
Problem
Existing methods for determining vacuum level thresholds in transfer chambers result in low accuracy, leading to extended evacuation times and reduced measurement throughput in electron beam measurement devices.
Innovation Solution
A method and apparatus that utilize a database of vacuum level curves and stabilization values to accurately determine a vacuum level threshold by matching real-time vacuum levels during the evacuating operation, allowing for precise identification of the vacuum level stabilization value corresponding to a target wafer, thereby optimizing the evacuation process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a preset vacuum level threshold is used for the transfer chamber, then the evacuation process can be simplified, but the accuracy of the vacuum level determination is low, leading to extended evacuation times
Solution Approach 1:
The patent pre-establishes a database containing multiple vacuum level curves and their corresponding stabilization values before the actual evacuation process. During evacuation, the system compares real-time vacuum level data against these pre-stored curves to automatically identify the matching curve and determine the threshold, eliminating the need for complex real-time calculations while achieving high accuracy
Solution Approach 2:
The patent creates a database that copies and stores multiple reference vacuum level curves from different wafer types with known outgassing rates. These copied curves serve as templates for comparison during actual evacuation, allowing the system to match the current evacuation profile against historical data to determine the appropriate threshold without performing complex measurements
2Productivity
If the vacuum level threshold is set with low accuracy, then the evacuation process can be faster, but the measurement throughput is reduced due to extended evacuation times
Solution Approach 1:
The patent implements a feedback mechanism where the system continuously monitors the real-time vacuum level during evacuation and compares it against the pre-stored vacuum level curves in the database. Based on this feedback, the system automatically identifies the matching curve and determines the appropriate threshold, ensuring optimal evacuation time without manual intervention or trial-and-error adjustments
3Measurement precision
If the transfer chamber is evacuated longer to ensure accuracy, then the vacuum level determination is more precise, but the measurement throughput decreases
Solution Approach 1:
The patent performs the complex curve matching and threshold determination in advance by pre-establishing the database of vacuum level curves. During actual evacuation, the system only needs to compare real-time data against these pre-prepared references, which significantly reduces the computational burden and time required for accurate threshold determination without compromising precision
Data Source
AI summary
The present application discloses a method and apparatus for determining a vacuum level threshold, a device, a medium, and a product, relating to the technical field of electron beam measurement. The method includes: performing an evacuating operation on a transfer chamber of a charged particle beam imaging apparatus after a target wafer is introduced into the transfer chamber; obtaining vacuum levels in the transfer chamber at a plurality of time points during the evacuating operation; searching for a first target vacuum level curve matching the vacuum levels at the plurality of time points from a plurality of first vacuum level curves in a database; and determining the vacuum level stabilization value corresponding to the first target vacuum level curve as a target vacuum level threshold of the transfer chamber corresponding to the target wafer.