Transflective LCD Common Electrode Disconnection Prevention
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Solution Overview
Problem
The existing methods for fabricating liquid crystal display devices often result in disconnection defects of the common electrode, particularly due to unintended light exposure during the photoresist developing process, which affects the formation of the finger portions of the common electrode.
Innovation Solution
A method involving the formation of a reflection prevention layer to absorb light and prevent its reflection from the reflective plate, ensuring accurate light exposure patterns during the photoresist development process, thereby preventing disconnection of the common electrode.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a reflective plate is formed in the reflective region to reflect external light, then the reflective display function is improved, but light reflection causes unintended exposure of photoresist during the light exposure process, leading to disconnection defects of the common electrode
Solution Approach 1:
A reflection prevention layer is introduced as an intermediary component between the reflective plate and the photoresist layer. This layer absorbs or blocks reflected light, preventing it from reaching the photoresist and causing unintended exposure. The reflection prevention layer acts as a mediator that resolves the conflict between maintaining reflective display function and preventing manufacturing defects.
Solution Approach 2:
The reflection prevention layer is formed in advance before the photoresist coating step, proactively preventing the harmful light reflection effect before it can affect the photoresist. By applying this counter-measure beforehand, the patent prevents the disconnection defect from occurring in the first place, rather than correcting it afterward.
2Manufacturing precision
If the common electrode is formed with narrow finger portions to improve display resolution, then the manufacturing precision is improved, but the finger portions become more susceptible to disconnection during photoresist development
Solution Approach 1:
The reflection prevention layer serves as a protective intermediary that shields narrow finger portions from unintended light exposure during the photoresist development process. This allows the common electrode to maintain narrow, high-resolution finger portions without compromising connection stability, as the reflection prevention layer prevents the light reflection that would cause disconnection.
3Manufacturing precision
If multiple mask processes are used to form the common electrode with precise patterns, then the manufacturing precision is improved, but the device complexity and production time increase
Solution Approach 1:
The patent extracts and addresses the root cause of pattern defects (light reflection from the reflective plate) by removing this interfering factor through the reflection prevention layer. This allows the photoresist patterning process to proceed without defects, achieving high precision with fewer process steps than would be required to compensate for reflection-induced defects.
Solution Approach 2:
The reflection prevention layer is formed in advance as a preliminary protective measure, preventing pattern defects before they occur during photoresist development. This preliminary action eliminates the need for additional corrective mask processes, thereby reducing overall device complexity and production time while maintaining high pattern precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively prevents disconnection of the common electrode, ensuring stable electric field induction and improved production efficiency by maintaining uniform finger portion widths and preventing deformation of the fringe electric field.
Implementation Method 1
forming a reflection prevention layer on the transparent conductive material layer
Implementation Method 2
a light exposure process using a photo mask, a process of developing the light-exposed photoresist
Data Source
AI summary
A method of fabricating a transflective type liquid crystal display device includes: forming gate and data lines with a gate insulating layer therebetween on a substrate and crossing each other to define a pixel region that includes a switching region, a reflective region, and a transmissive region; forming a thin film transistor corresponding to the switching region and connected to the gate and data lines; forming a first passivation layer on the thin film transistor; forming a reflective plate on the first passivation layer in the reflective region; forming a second passivation layer on the reflective plate; forming a pixel electrode on the second passivation layer and connected to a drain electrode of the thin film transistor; forming a third passivation layer on the pixel electrode.