Transflective LCD Pixel Electrode Embossed Pattern
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Transflective liquid crystal display (LCD) devices with thin film transistors face high manufacturing costs and complex processes due to increased number of processes and masks, which deteriorate productivity and yield.
Innovation Solution
A transflective LCD device with a thin film transistor, featuring a device substrate with reflection and transmission regions, a passivation layer, a stacked pixel electrode structure with an embossed pattern, and a reflective layer formed on the pixel electrode, which omits the organic insulating layer to simplify manufacturing and enhance adhesion, using diluted hydro-fluoride etching and conductive materials for the pixel and reflective layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a reflective layer is formed in transflective LCD to reflect external light or transmit backlight, then display performance is improved, but manufacturing cost increases and process complexity increases
Solution Approach 1:
The patent combines the pixel electrode and reflective layer into a single integrated structure. The pixel electrode is formed with a reflective portion that directly serves as the reflective layer, eliminating the need for separate reflective layer deposition processes. This merging reduces the number of manufacturing steps and masks while maintaining the dual functionality of light reflection and electrical control.
Solution Approach 2:
The pixel electrode is designed to perform multiple functions: it controls the liquid crystal switching and simultaneously serves as the reflective layer. The reflective portion of the pixel electrode reflects external light in reflective mode while the transparent portion allows backlight transmission in transmissive mode. This multi-functionality reduces device complexity by eliminating dedicated reflective layer structures.
2Adaptability or versatility
If multiple masks and processes are used in transflective LCD manufacturing, then display functionality is improved, but productivity deteriorates and manufacturing yield decreases
Solution Approach 1:
The patent merges the pixel electrode formation and reflective layer formation into a single photolithography and sputtering process. By designing the pixel electrode pattern to include both transparent and reflective portions, the invention eliminates the need for separate masks for pixel electrode and reflective layer definition, thereby improving productivity and manufacturing yield.
Solution Approach 2:
The patent changes the material parameters of the pixel electrode to enable dual functionality. By using a transparent conductive oxide material with appropriate thickness and optical properties, the pixel electrode can simultaneously control liquid crystal and reflect light. This parameter change allows single-process formation of both functional layers.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces manufacturing costs, simplifies processes, enhances productivity, and improves product reliability by increasing light reflection and luminance through embossed patterns and the use of ZnO alloy, while preventing reflective layer exfoliation.
Implementation Method 1
a reflective layer formed on the second pixel electrode and formed in the reflection region of the device substrate
Implementation Method 2
embossed pattern on the first pixel electrode
Implementation Method 3
using diluted hydro-fluoride etching
Data Source
AI summary
There are provided a thin film transistor substrate for transflective liquid crystal display device (LCD) and a manufacturing method thereof, which can reduce manufacturing cost and simplifying manufacturing processes. In the method, a thin film transistor is formed on a reflection region of a device substrate defined by the reflection region and a transmission region. A passivation layer is formed on the thin film transistor so as to expose a drain electrode of the thin film transistor and to cover the thin film transistor. A pixel electrode is formed on the transmission and reflection regions. The pixel electrode has a structure of a first pixel electrode electrically connected to the drain electrode and a second pixel electrode formed to have an embossed pattern on the first pixel electrode. A reflective layer is formed on the second electrode pixel having the embossed pattern on the reflection region.