Transflective LCD Pixel Structure Single Metal Layer Patterning
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Solution Overview
Problem
Conventional transflective LCD pixel structures have complex manufacturing processes requiring multiple photolithography steps, leading to increased production costs and inefficiencies.
Innovation Solution
A simplified pixel structure for transflective LCDs where the reflection layer and gate electrode of the TFT are formed in a single patterning process using the same metal layer, reducing the number of photolithography steps and masks needed, and integrating reflective and transmissive region pixel electrodes to streamline the manufacturing process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If seven photolithography processes are adopted to form gate electrode, reflection layer, and pixel electrodes separately, then each component can be precisely formed, but the manufacturing process becomes complex and production efficiency decreases
Solution Approach 1:
The patent combines the formation of the gate electrode and reflection layer into a single photolithography process by using a common metal layer that serves both functions. The metal layer is patterned to form the gate electrode in the TFT region and the reflection layer in the reflective region simultaneously, reducing the number of photolithography steps from seven to fewer processes while maintaining manufacturing precision.
Solution Approach 2:
The metal layer is designed to perform multiple functions: it serves as the gate electrode material in the TFT region and as the reflection layer material in the reflective region. This multi-functional design allows a single metal deposition and patterning process to create both components, simplifying the overall manufacturing process without sacrificing the precision of either component.
2Manufacturing precision
If multiple photolithography processes and masks are used for forming different layers, then each layer can be independently optimized, but production time and cost increase
Solution Approach 1:
The patent merges the photolithography processes for the gate electrode and reflection layer into a single step. By using a common metal layer that is deposited and patterned once to form both components, the number of photolithography cycles and masks is reduced, directly improving production efficiency while maintaining the ability to independently optimize the patterns through single-step lithography design.
3Ease of manufacture
If separate metal layers are used for gate electrode and reflection layer, then each can be independently controlled, but the manufacturing process and material usage become more complex
Solution Approach 1:
The patent combines the gate electrode and reflection layer into a single metal layer structure. The same metal layer is deposited and then patterned to form both the gate electrode in the TFT region and the reflection layer in the reflective region. This approach reduces material complexity and simplifies the manufacturing process while maintaining independent control through pattern design during the single photolithography step.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, reduces production costs, and enhances light reflection with an uneven reflection layer surface, improving outdoor readability of LCDs.
Implementation Method 1
The transflective LCD improves the contrast of the outdoor LCD by increasing the reflectivity of the panel
Data Source
AI summary
An embodiment of the disclosed technology provides a pixel structure, comprising a TFT, a reflective region and a transmissive region, wherein the reflective region comprises a reflective region insulation layer, a reflection layer on the reflective region insulation layer and a reflective region pixel electrode on the reflection layer, and the transmissive region comprises a transmissive region pixel electrode, wherein the reflective region pixel electrode and the transmissive region pixel electrode form an integral structure, and the integral structure of the pixel electrodes is connected with the drain electrode of the TFT, wherein the organic layer in the reflective region is formed on an array substrate prior to a gate electrode of the TFT, and the reflection layer in the reflective region and the gate electrode of the TFT are formed in a same patterning process by using a same metal layer.