Transflective LCD Pixel Structure Formation via Self-Aligned Conductive Layers
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Solution Overview
Problem
The traditional method for forming a pixel structure in transflective liquid crystal display (LCD) devices is overly complex, requiring multiple photo mask processes and steps, which limits output quantity and increases production costs.
Innovation Solution
A method involving ion implantation processes to form doping regions and conductive layers, with a reduced number of photo mask steps to create reflective and transmission regions, simplifying the formation of pixel structures by integrating conductive layers and etching processes to form data lines and electrodes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional photo mask processes are used to define patterns of elements, then the pixel structure can be formed with high precision, but the manufacturing process becomes too complicated with eight or nine photo mask steps
Solution Approach 1:
The patent combines multiple photo mask processes into a single photo mask step by using a self-aligned multi-layer conductive structure. The first conductive layer forms gate lines and gate electrodes, while the second conductive layer forms data lines and pixel electrodes, all defined in one lithography step through precise spatial arrangement and self-alignment, eliminating the need for eight or nine separate photo mask processes
Solution Approach 2:
The patent segments the conductive structure into two distinct conductive layers with different functions. The first conductive layer is dedicated to gate structures (gate lines and gate electrodes), while the second conductive layer is dedicated to pixel structures (data lines and pixel electrodes). This segmentation allows each layer to be optimized independently while being formed through a unified photo mask process
2Manufacturing precision
If traditional photo mask processes are used to define patterns of elements, then the pixel structure can be formed with high precision, but the output quantity of LCD devices is quite limited
Solution Approach 1:
The patent merges multiple sequential photo mask steps into a single parallel process, where all conductive patterns (gate lines, gate electrodes, data lines, and pixel electrodes) are defined simultaneously in one lithography step. This dramatically reduces manufacturing cycle time and increases production throughput while maintaining pattern precision through self-alignment design
3Manufacturing precision
If traditional photo mask processes are used to define patterns of elements, then the pixel structure can be formed with high precision, but it is hard to decrease the cost of forming the traditional transflective LCD device
Solution Approach 1:
The patent consolidates eight or nine separate photo mask processes into a single photo mask step, significantly reducing material consumption (photoresist, masks), equipment usage time, and labor costs. The self-aligned design eliminates the need for multiple alignment operations and reduces defect rates, further lowering manufacturing costs while maintaining high pattern precision
Solution Approach 2:
The patent employs self-alignment mechanisms where the positions of data lines and pixel electrodes are automatically determined by their geometric relationships with gate structures, without requiring additional alignment photo mask steps. This self-service approach to alignment eliminates costly and time-consuming alignment processes while ensuring precise pattern definition
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, improves product yield, and reduces costs by reducing the number of photo mask processes from eight or nine to five, enhancing the efficiency and reliability of pixel structure formation in transflective LCD devices.
Implementation Method 1
a first ion implantation process is performed on parts of the patterned semiconductor layer, so as to form a first doping region in the patterned semiconductor layer
Implementation Method 2
an etching process is performed to remove parts of the second conductive layer and parts of the first metal layer in the transmission region simultaneously
Data Source
AI summary
A forming method of the present invention includes forming a first patterned conductive layer, which includes a transparent conductive layer and a metal layer stacked together on a substrate, where the first patterned conductive layer functions as gate lines, gate electrodes, common lines and predetermined transparent pixel electrode structures; and forming a second patterned conductive layer on the substrate. The second patterned conductive layer includes data lines and reflective pixel electrodes, and be directly connected to doping regions, such as source regions/drain regions. According to the forming method of the present invention, pixel structures of a transflective liquid crystal display device can be formed through five mask processes. Therefore, the manufacturing process of the transflective liquid crystal display device is effectively simplified, so the product yield is improved and the cost can be reduced.