Transflective Shutter Mask for LCD Substrate Exposure
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Solution Overview
Problem
The increasing size of LCD devices requires larger irradiation areas and photo masks, leading to increased manufacturing costs due to the need for separate masks and complex exposing apparatuses for patterning multiple layers on TFT and color filter substrates.
Innovation Solution
A method and apparatus using a mask with first and second slits, where first light passes through a transflective shutter to generate second light, allowing for adjustable light exposure and eliminating the need for slit or half-tone masks by using a blocking shutter to control exposure regions, thereby reducing manufacturing complexity and cost.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If separate masks are used for forming patterns on multiple layers, then the patterning precision is improved, but the device complexity and manufacturing cost increase
Solution Approach 1:
The mask is divided into multiple independent slits (first slits and second slits) that can be selectively used. Each slit can expose different regions or layers of the substrate, allowing complex multi-layer patterning to be achieved through a single segmented mask structure rather than multiple separate masks.
Solution Approach 2:
The blocking shutter with movable blocking plates is introduced to dynamically control which slits are active during exposure. The blocking plates can be moved to block or unblock specific slits, enabling flexible configuration of the mask for different exposure scenarios without changing the physical mask structure.
2Device complexity
If a single mask is used for multiple layers, then the device complexity is reduced, but the light intensity control for different regions becomes insufficient
Solution Approach 1:
Different slits in the mask are designed with different characteristics (first slits for one region, second slits for another region). The blocking shutter allows selective activation of specific slits, providing local control over light intensity and exposure patterns for different regions of the substrate.
Solution Approach 2:
The blocking shutter acts as an intermediary between the light source and the substrate, mediating the light intensity distribution. By selectively blocking or unblocking slits, it enables precise control over which regions receive light and at what intensity, without requiring complex variations in the mask structure itself.
3Manufacturing precision
If multiple masks are used for different exposure areas, then the exposure precision is improved, but the manufacturing cost increases
Solution Approach 1:
Multiple mask functions are merged into a single mask structure containing both first slits and second slits. This unified mask can perform multiple exposure tasks that would traditionally require separate masks, reducing the number of mask fabrication processes and associated costs while maintaining exposure precision through the coordinated use of different slits.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for efficient exposure of substrates with varying light intensities across different areas, reducing the need for multiple masks and simplifying the manufacturing process, thereby decreasing costs and improving the efficiency of LCD substrate production.
Implementation Method 1
The first light passes through a transflective shutter to generate the second light
Data Source
AI summary
A photoresist layer exposed through first slits of a mask is exposed using first light. The photoresist layer exposed through second slits of the mask is exposed by using second light. The first light passes thorough a transflective shutter to generate the second light.