Translucent Resin Member with SiOX Interlayer for Alkali Resistance

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Solution Overview

Problem

Translucent resin members, particularly polycarbonate, face issues with weather resistance, abrasion resistance, productivity, and alkali resistance due to surface damage and peeling of silicon dioxide layers when exposed to alkaline solutions.

Innovation Solution

A translucent resin member configuration featuring an acrylic hard coat layer, a SiOX layer formed by deposition, and a dense Si(1-Y)CYOX layer formed by plasma CVD, where the SiOX layer protects the acrylic hard coat layer from plasma damage and the Si(1-Y)CYOX layer minimizes alkaline solution transmission, enhancing alkali resistance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a silicon-based hard coat layer is formed by thermal curing on a PC substrate, then weather resistance and abrasion resistance are improved, but productivity decreases and manufacturing costs increase due to long curing time (30-60 minutes)

Engineering Contradiction:
Improveweather resistanceVSAvoidproductivity
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent changes the curing mechanism from thermal curing (requiring 30-60 minutes at elevated temperatures) to UV light curing (completing in seconds to minutes at room temperature). This parameter change in the curing process enables rapid production while maintaining the protective function of the hard coat layer, thereby resolving the contradiction between weather resistance and productivity

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent replaces the thermal curing mechanism with a photochemical UV curing mechanism. Instead of using heat and time for curing, UV light initiates rapid polymerization of the acrylic-based hard coat material, substituting a thermal process with a photochemical one to achieve both high reliability and productivity

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Productivity

If a SiO2 layer is formed by plasma CVD directly on an acrylic hard coat layer, then productivity is improved, but alkali resistance deteriorates due to plasma damage to the acrylic layer and subsequent peeling when exposed to alkaline solutions

Engineering Contradiction:
ImproveproductivityVSAvoidalkali resistance
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent introduces a SiOX layer as an intermediary between the acrylic hard coat layer and the SiO2 layer. This intermediate layer acts as a protective barrier that prevents direct plasma contact with the acrylic layer during CVD processing, eliminating plasma-induced damage and subsequent alkali resistance problems while maintaining the benefits of plasma CVD formation

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent applies a SiOX layer beforehand to cushion and protect the acrylic hard coat layer from the harmful effects of plasma exposure during subsequent SiO2 layer formation. This preliminary protective measure prevents the acrylic layer from being damaged by plasma, thereby preventing future peeling issues when exposed to alkaline environments

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The configuration significantly improves alkali resistance, weather resistance, abrasion resistance, productivity, and thermal resistance while maintaining transparency and strength, as demonstrated by reduced peeling and surface damage in alkali resistance tests.

Implementation Method 1

a SiOX layer which is formed by deposition

Methodology Applied
Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Implementation Method 2

a Si(1-Y)CYOX layer (0

Methodology Applied
Scientific EffectPlasma Enhanced Chemical Vapour Deposition: Plasma Enhanced Chemical Vapour Deposition

Implementation Method 3

the acrylic hard coat layer is UV-cured in the absence of oxygen

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS10738195B2Translucent resin member
Publication Date: 2020.08.11 KOITO MFG CO LTD
  • US10738195B2 patent drawing

AI summary

Provided is a translucent resin member including: an acrylic hard coat layer, a SiOX layer (1.2<X<2), and a Si(1-Y)CYOX layer (0<Y<1, 1.2<X<2) sequentially provided on a polycarbonate (PC) substrate. The acrylic hard coat layer may be UV-cured in the absence of oxygen. The SiOX layer may be formed by deposition. The Si(1-Y)CYOX layer may be formed by plasma chemical vapor deposition (CVD).