Transparent Conductive Electrode Etching Line Segmentation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Transparent conductive electrodes in touch panels face a challenge in achieving both high conductivity and low visibility, as increasing conductivity makes the etching lines more visible, and reducing the conductive material concentration or thickness compromises touch-sensing functionality, especially in large-sized products.
Innovation Solution
The design includes first and second outer etching lines parallel to each other, with first and second inner etching lines between adjacent electrode patterns, where the second distance is greater than or equal to 1.5 times the first distance and less than or equal to 15 times the first distance, optimizing the arrangement to enhance conductivity while minimizing visibility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the amount of conductive material or thickness of conductive material layer is increased to improve conductivity, then the etching lines become wider and deeper, which increases visibility of the transparent conductive electrodes
Solution Approach 1:
The patent divides the single etching line into multiple etching lines (first outer etching line, second outer etching line, and first inner etching lines). This segmentation allows the conductive material to be separated into distinct regions with insulation between them, enabling higher conductive material concentration without causing short circuits, thus improving conductivity while maintaining low visibility
Solution Approach 2:
The patent applies different etching line configurations to different regions: outer etching lines define the boundaries of electrode patterns while inner etching lines provide additional insulation between adjacent electrodes. This local differentiation allows optimized conductive material distribution - sufficient material for conductivity in electrode regions, with controlled insulation in etching line regions
2Illumination intensity
If the amount of conductive material or thickness of conductive material layer is decreased to improve visibility, then the resistance of transparent conductive electrodes becomes too high to provide sufficient touch-sensing function
Solution Approach 1:
By segmenting the etching lines into multiple parallel lines with specific spacing relationships (second distance ≥ 1.5 × first distance), the patent creates sufficient insulation barriers to allow lower conductive material concentration while preventing short circuits, thus maintaining visibility while ensuring adequate conductivity for touch sensing
3Area of stationary object
In large sized products with larger area and longer length, the transparent conductive electrodes have higher resistance, making it more difficult to simultaneously achieve high conductivity and low visibility
Solution Approach 1:
The multi-line etching pattern creates multiple parallel conduction paths within the electrode patterns while maintaining insulation between adjacent electrodes. This segmentation strategy is particularly effective for large-area electrodes where longer current paths would otherwise result in excessive resistance, allowing adequate conductivity to be maintained across large dimensions while preserving visibility
Solution Approach 2:
The patent transitions from a single-line insulation approach to a multi-line insulation approach with specific dimensional relationships. By introducing multiple etching lines with defined spacing ratios, the solution adds dimensional complexity to the etching pattern design, enabling better control over both conductivity and visibility in large-area applications
Data Source
AI summary
Transparent conductive electrodes of a touch panel including a plurality of first electrode patterns are provided. An edge of each of the first electrode patterns has a first outer etching line and a second outer etching line that are parallel to each other. A plurality of first inner etching lines are formed between any two of the adjacent first electrode patterns. A first distance is defined between each of the first outer etching lines and each of the second outer etching lines. A second distance is defined between each of the second outer etching lines and each of the first inner etching lines adjacent and parallel thereto. The first distance is less than the second distance, and the second distance is less than or equal to 15 times the first distance. The first distance is less than a distance between any two of the first inner etching lines.