Transparent Cover Image Formation via Coating and Etching
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Solution Overview
Problem
Existing transparent protective covers for IT devices like smartphones and smart TVs often have image films that detach easily and can obstruct screen views, especially when used or turned off, causing inconvenience and aesthetic issues.
Innovation Solution
A method involving a coating layer with a thickness of 0.01 to 2 μm, composed of titanium oxide and silicon oxide, is applied to the backside of the transparent member, allowing image formation through UV exposure and etching, ensuring the image is only visible when the device is off and not obstructing the screen when on.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If an image film is attached on the transparent protective cover, then the appearance is beautified, but the image film is easily detached and partially covers on the pictures of the touch screen
Solution Approach 1:
The image is extracted from a separate detachable film and integrated directly into the transparent cover through coating and etching processes. The image pattern is formed by removing material to create a permanent part of the cover structure, eliminating the detachment problem of separate films.
Solution Approach 2:
The image layer is merged with the transparent cover as a single integrated component. The coating layer with etched image pattern becomes an intrinsic part of the cover structure, combining the protective function and aesthetic function in one unified element.
2Ease of manufacture
If a logo image is formed on corner parts of the display panel, then the logo is visible, but the logo image may cover part of the screen when information screen is displayed
Solution Approach 1:
The image is localized to specific regions (edge parts or corner parts) of the transparent cover, allowing different areas to serve different functions. The image areas provide branding visibility while the central display areas remain fully available for information screens.
Solution Approach 2:
The image is positioned in the dimensional space of the transparent cover's edge or corner regions, utilizing the vertical and lateral dimensions of the cover structure. This spatial arrangement allows the image to occupy the periphery while leaving the central viewing area completely clear for display purposes.
3Illumination intensity
If the coating layer thickness is increased to improve image visibility, then the image becomes more visible, but the optical transmittance decreases
Solution Approach 1:
The thickness of the coating layer is precisely controlled within the range of 0.01 to 2 μm to optimize the balance between image visibility and optical transmittance. This parameter optimization ensures the image is sufficiently visible while maintaining high light transmission for clear display viewing.
Solution Approach 2:
The etching process creates a three-dimensional relief structure in the coating layer that enhances image visibility through light scattering and shadow effects. This structural approach allows the image to be more visible without requiring increased material thickness, thereby preserving optical transmittance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents image damage and ensures the image is only visible when the device is turned off, providing a clear information screen when on, enhancing user experience and aesthetic appeal.
Implementation Method 1
exposing the dry film photoresist by covering the dry film photoresist with a photo mask having an image pattern and irradiating the photo mask with UV
Implementation Method 2
performing an etching process for removing other area of the coating layer except for the image area of the coating layer facing the image area of the dry film photoresist
Data Source
AI summary
There is provided a method for forming an image on a transparent member, the method comprising: a) forming a coating layer on a surface of the transparent member; b) attaching a dry film photoresist on the coating layer; c) exposing the dry film photoresist by covering the dry film photoresist with a photo mask having an image pattern and irradiating the photo mask with UV; d) performing a development process for removing other area of the dry film photoresist except for an image area of the dry film photoresist; e) performing an etching process for removing other area of the coating layer except for the image area of the coating layer facing the image area of the dry film photoresist; and f) performing a strip process for removing the image area of the dry film photoresist.


