Transparent Display Adhesive Layer Design

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Solution Overview

Problem

The challenge in manufacturing transparent display devices is achieving high adhesion between the substrate and insulation layers during the crystallization process while maintaining optimal transmittance, as existing methods often result in reduced adhesion and altered optical properties.

Innovation Solution

Incorporating an adhesive layer with aluminum oxide between the base substrate and barrier layer, which has a refractive index of 1.6 to 1.8 and compressive stress, to enhance adhesion and prevent detachment during high-temperature processes, and using silicon oxynitride for the barrier, gate insulation, and insulating layers to minimize refractive index variations and maintain transmittance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If multiple insulation layers with different materials are stacked to manufacture the OLED device, then the adhesion between layers may be improved, but the optical property is reduced and proper transmittance cannot be easily obtained

Engineering Contradiction:
Improveadhesion between layersVSAvoidtransmittance
Core Design Contradiction:
StrengthVSIllumination intensity

Solution Approach 1:

The patent uses silicon oxynitride as a uniform material for multiple insulation layers (barrier layer, gate insulation layer, insulating interlayer, via insulation layer) instead of stacking different materials. This homogeneous material selection maintains consistent optical properties and high transmittance while providing sufficient adhesion between layers through the uniform refractive index of silicon oxynitride.

Inventive Principle:
Principle #33Homogeneity

2Stability of the object's composition

If a crystallization process is performed at a relatively high temperature to crystallize the semiconductor layer, then the semiconductor layer may be properly crystallized, but the adhesion between the substrate and the insulation layer is reduced, causing the insulation layer to detach

Engineering Contradiction:
Improvecrystallization of semiconductor layerVSAvoidadhesion between substrate and insulation layer
Core Design Contradiction:
Stability of the object's compositionVSStrength

Solution Approach 1:

The patent changes the material parameter of the insulation layer to silicon oxynitride, which has specific thermal and adhesive properties that allow it to maintain strong adhesion to the substrate during high-temperature crystallization processes. This material parameter change enables the insulation layer to withstand the thermal stress without detaching while still allowing proper crystallization of the semiconductor layer.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution effectively increases adhesion strength between the substrate and insulation layers, preventing detachment during crystallization and maintaining improved transmittance by minimizing refractive index changes and reducing total reflection.

Implementation Method 1

the adhesive layer may have a compressive stress therein

Methodology Applied
Scientific EffectCompressive stress:

Implementation Method 2

a refractive index of the adhesive layer may be in a range of about 1.6 to about 1.8

Methodology Applied
Scientific EffectRefraction: Refraction

Data Source

PatentUS10068923B2Transparent display device and method of manufacturing the same
Publication Date: 2018.09.04 SAMSUNG DISPLAY CO LTD
  • US10068923B2 patent drawing
  • US10068923B2 patent drawing
  • US10068923B2 patent drawing

AI summary

A transparent display device includes a base substrate having a pixel area and a transmission area, a barrier layer disposed on the base substrate, a pixel circuit disposed in the pixel area, a display structure disposed on the pixel circuit, a transmitting structure disposed in the transmission area, an adhesive layer disposed between the base substrate and the barrier layer, and between the base substrate and the transmitting structure, and a transmitting window defined in the transmission area where the transmitting structure may include a composition including silicon oxynitride, the adhesive layer may include aluminum oxide, and the transmitting window may expose a surface of the transmitting structure.