Transparent Electrode Sputtering on Resin Substrates
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Solution Overview
Problem
Resin substrates have low heat resistance, limiting the processing temperature for transparent electrodes, making it difficult to achieve low resistivity and sufficient crystallization, which hinders their application in high-definition and large-area touch panels.
Innovation Solution
A manufacturing method involving sputtering of indium tin oxide on a transparent film substrate with optimized sputtering gas flow rates and pressures to achieve a low-resistivity transparent electrode layer, with a crystallization step at temperatures below the resin substrate's heat-resistant limit.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the thickness of the transparent conductive film is increased to reduce resistance, then the resistance decreases, but the screen image becomes colored due to absorption of short-wavelength light, leading to deterioration of visibility
Solution Approach 1:
The invention changes the physical and chemical parameters of the transparent conductive film by controlling the sputtering gas composition (oxygen partial pressure 1-100 sccm, argon partial pressure 5-500 sccm) and substrate temperature (100-200°C) during deposition. These parameter changes enable the formation of a film with optimized crystal structure and lower resistivity, achieving low resistance without increasing thickness, thus preventing screen image coloring.
2Measurement precision
If the pattern width of electrodes is reduced to improve position detection accuracy, then the accuracy improves, but the cross-sectional area decreases, leading to an increase in resistance of the electrode
Solution Approach 1:
The invention changes the deposition parameters including oxygen partial pressure (1-100 sccm), argon partial pressure (5-500 sccm), and substrate temperature (100-200°C) to achieve a transparent conductive film with lower resistivity. This allows the electrode pattern width to be reduced for higher position detection accuracy while maintaining low resistance through the optimized film properties.
3Reliability
If the heating temperature for crystallization is increased to reduce resistance of the transparent electrode, then the resistance decreases, but the resin substrate cannot withstand the high temperature, limiting the processing temperature
Solution Approach 1:
The invention optimizes the deposition parameters (oxygen partial pressure 1-100 sccm, argon partial pressure 5-500 sccm, substrate temperature 100-200°C) to form a transparent conductive film that achieves low resistivity through controlled deposition conditions rather than high-temperature crystallization. This enables processing on heat-sensitive resin substrates while still achieving the desired low resistance.
4Area of stationary object
If the distance between frame edges increases to accommodate larger display area, then the display area increases, but the distance of the electrode increases, so that the resistance of the electrode increases
Solution Approach 1:
The invention changes the deposition parameters (oxygen partial pressure 1-100 sccm, argon partial pressure 5-500 sccm, substrate temperature 100-200°C) to achieve a transparent conductive film with lower resistivity. This allows larger display areas with increased electrode distances while maintaining low overall resistance through the optimized film properties.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method results in a transparent electrode with resistivity less than 3.0×10−4 Ωcm, suitable for high-definition and large-area touch panels, while maintaining a small thickness to prevent screen image coloring.
Implementation Method 1
a transparent electrode layer formed of indium tin oxide on a transparent film substrate by a sputtering method
Implementation Method 2
heated under an oxygen atmosphere to crystallize the conductive oxide, thereby reducing the resistance
Data Source
AI summary
A resin substrate with a transparent electrode having a low resistance, and a manufacturing method thereof including: a deposition step wherein a transparent electrode layer of indium tin oxide is formed on a transparent film substrate by a sputtering method, and a crystallization step wherein the transparent electrode layer is crystallized. In the deposition step, a sputtering deposition is performed using a sputtering target containing indium oxide and tin oxide, while a sputtering gas containing argon and oxygen is introduced into a chamber. It is preferable that an effective exhaust rate S, calculated from a rate Q of the sputtering gas introduced into the chamber and a pressure P in the chamber by a formula S (L/second)=1.688×Q (sccm)/P (Pa), is 1,200-5,000 (L/second). It is also preferable that a resistivity of the transparent electrode layer is less than 3×10−4 Ωcm.