Transparent Photomask for Ultrafine Conductive Mesh
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Solution Overview
Problem
Current methods for manufacturing ultrafine mesh structures for touch screens face challenges such as visual recognition issues, Moiré effects, and high processing costs, particularly in achieving line widths in the submicrometer scale, which limits the scalability and efficiency of touch electrodes.
Innovation Solution
A method involving the formation of a master mold with convex or concave mesh patterns using a transparent photomask, where linear patterns are carved to cross each other, allowing for the creation of ultrafine mesh structures with line widths between 100 nm and 900 nm, enabling the production of conductive mesh patterns suitable for large-area transparent electrodes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If the line width of the touch electrode mesh structure is decreased to reduce visual recognition and Moiré effects, then the optical transmittance and aesthetic appearance are improved, but the manufacturing complexity and processing cost increase significantly due to the limit of implementable line width in micro patterns
Solution Approach 1:
The patent uses a master mold with micro patterns as a template to create photomasks, which are then used to replicate the mesh structure across large areas. This copying approach allows ultrafine patterns to be manufactured without directly writing each line, thereby reducing manufacturing complexity while achieving the required submicrometer line widths for high optical transmittance
Solution Approach 2:
The patent creates a master mold with convex or concave micro patterns before producing the final photomask. This preliminary action of pre-forming the pattern structure in the master mold enables subsequent mass production of ultrafine mesh patterns without repeatedly facing the complexity of direct submicrometer fabrication
2Area of stationary object
If conventional transparent metal oxide materials are used for large-area touch screens, then the optical transmittance is maintained, but surface damage and anion impact increase in proportion to deposition time, making it difficult to manufacture large touch screens
Solution Approach 1:
The patent replaces the conventional deposition process with a photolithography-based patterning process using transparent photomasks. Instead of depositing metal oxide layers that suffer from surface damage and anion impact during prolonged deposition, the invention uses light transmission through patterned masks to define electrode structures, eliminating the deposition-time-dependent quality degradation
3Manufacturing precision
If ultrafine mesh structures with line width less than 1 μm are manufactured using conventional methods, then the visual recognition and Moiré effects are reduced, but the processing cost increases significantly, making mass manufacturing and large-area production problematic
Solution Approach 1:
The patent segments the manufacturing process into distinct stages: creating a master mold with micro patterns, fabricating photomasks from the master mold, and using these photomasks to pattern the touch electrode mesh. This segmentation allows the ultrafine patterning step to be performed once in the master mold, with subsequent mass production using the replicated photomasks, thereby maintaining submicrometer precision while enabling high productivity
Solution Approach 2:
The patent changes the manufacturing approach from direct conventional lithography to a two-stage process involving master mold fabrication and photomask replication. This parameter change in the manufacturing methodology enables ultrafine line widths to be achieved economically through replication rather than direct fabrication, solving both precision and productivity requirements
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method simplifies the manufacturing of ultrafine mesh structures, overcoming surface resistance limitations of metal oxide-based electrodes, facilitating their application to flexible electronic devices and enabling uniform pattern formation on various surfaces, including curved ones, with improved processing efficiency and scalability.
Implementation Method 1
forming a first photosensitive material pattern layer by making a transparent photomask, in which linear patterns are carved, be in contact with an upper surface of the first photosensitive material layer
Data Source
AI summary
The present invention relates to a method for manufacturing a master mold, a master mold manufactured by the method, a method for manufacturing a transparent photomask, a transparent photomask manufactured by the method, and a method for manufacturing a conductive mesh pattern by using the transparent photomask.