Transparent Storage Capacitor Aperture Ratio Array Substrate

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Solution Overview

Problem

Existing large-size and high-resolution display panels face challenges in increasing the aperture ratio due to the space occupied by thin film transistors (TFTs) and capacitors, which limits pixel light transmission and affects display panel resolution.

Innovation Solution

The array substrate design includes a thin film transistor and a storage capacitor with transparent electrodes, where the second electrode is formed on the same level as the active layer and spaced apart from the source/drain, allowing for simultaneous formation of the first electrode and gate using half-tone masking, and the second electrode is conductorized during source/drain formation, enabling light transmission and reducing manufacturing costs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Illumination intensity

If traditional opaque electrodes are used for storage capacitor, then the capacitor can be formed with standard materials and processes, but the aperture ratio is reduced because the capacitor occupies pixel area and blocks light transmission

Engineering Contradiction:
Improveaperture ratioVSAvoidmanufacturing complexity
Core Design Contradiction:
Illumination intensityVSEase of manufacture

Solution Approach 1:

The patent changes the material parameter of the electrode from opaque (traditional ITO) to transparent (double-layer structure of ITO and Mo), enabling light transmission through the storage capacitor electrode while maintaining electrical functionality. This parameter change allows the capacitor to be positioned in the pixel area without blocking light, thereby increasing the aperture ratio.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs a composite material structure for the transparent electrode consisting of two layers: an ITO layer and a Mo layer. This composite structure combines the electrical conductivity of ITO with the transparency and low-cost advantages of Mo, achieving both optical and electrical requirements while simplifying the manufacturing process.

Inventive Principle:
Principle #40Composite materials

2Ease of manufacture

If multiple photomasks are used for forming electrode and gate separately, then precise patterning can be achieved, but manufacturing cost and process complexity increase

Engineering Contradiction:
Improvemanufacturing costVSAvoidpatterning precision
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent merges the patterning of the transparent electrode and the gate into a single photomasking step. By designing the photomask pattern to simultaneously define both the electrode and gate regions, the process reduces the number of photomasks from multiple to just one, lowering manufacturing cost and complexity while maintaining adequate patterning precision through careful mask design.

Inventive Principle:
Principle #5Merging (Combining)

3Illumination intensity

If transparent electrode materials are used, then light transmission is improved and aperture ratio increases, but material selection and process control become more challenging

Engineering Contradiction:
Improvelight transmissionVSAvoidmaterial complexity
Core Design Contradiction:
Illumination intensityVSDevice complexity

Solution Approach 1:

The patent uses a composite electrode structure with ITO and Mo layers. ITO provides the necessary transparency and conductivity, while Mo adds structural stability and cost benefits. This composite approach balances optical performance with material availability and process compatibility, reducing the overall complexity compared to using exotic transparent conductive oxides alone.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent optimizes the thickness parameters of the ITO and Mo layers to achieve the desired balance between transparency and conductivity. By carefully controlling these thickness parameters, the design achieves high light transmission while maintaining sufficient electrical performance, thereby reducing material complexity through parameter optimization rather than requiring complex material compositions.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS11233074B2Array substrate and manufacturing method thereof
Publication Date: 2022.01.25 SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
  • US11233074B2 patent drawing
  • US11233074B2 patent drawing
  • US11233074B2 patent drawing

AI summary

The present application provides an array substrate and a manufacturing method thereof. The array substrate includes a thin film transistor and a storage capacitor prepared on a substrate; the thin film transistor includes a gate, an active layer, and a source/drain; the storage capacitor includes a first electrode and a second electrode isolated therefrom by a dielectric layer; the gate is disposed above the first electrode and located at one end of the first electrode; and the second electrode corresponds to a portion of the first electrode non-corresponding to the gate.